Characterization of a laser-plasma extreme-ultraviolet source using a rotating cryogenic Xe target

Amano, Sho; Masuda, Kazuya; Shimoura, Atsushi; Miyamoto, Shuji; Mochizuki, Takayasu

doi:10.1007/s00340-010-3997-7

Cited by 15 publications

(6 citation statements)

References 10 publications

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“…In our previous study of a laser plasma extreme ultraviolet (EUV) source, which used a cryogenic Xe target that was supplied using a rotating drum system with wipers, we found that increments in EUV energy occurred when the drum was rotating, as compared with the case when the drum was at rest. 18,19) This is discussed in detail in Ref. 19 and we considered that the wipers caused these increments.…”

Section: Dependence On Target Operational Conditionsmentioning

confidence: 99%

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Water-window soft X-ray source using cryogenic Ar laser plasma

Amano

2018

Jpn. J. Appl. Phys.

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A water-window soft X-ray source using laser plasma from a cryogenic solid Ar target has demonstrated an average output power of 0.5 W with continuously repeated pulses at 3.3 Hz. A higher output power of up to 1 W at 10 Hz can be achieved by simply improving the target system. The characteristics of the Ar ion debris from the plasma were also studied and the kinetic energies of the main ions were found to be less than 2 keV. Using the measured ion spectrum, the erosion damage sputtered by Ar ions on the silicon nitride membrane was studied and the results indicated that the damage should cause no problems in the application of a contact soft X-ray microscope. Our laser plasma X-ray source will provide a compact and convenient source suitable for the soft X-ray microscopy in place of conventional synchrotron facilities.

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Section: Dependence On Target Operational Conditionsmentioning

confidence: 99%

“…18,19) This is discussed in detail in Ref. 19 and we considered that the wipers caused these increments. Therefore, in the substrate translation system in the present case, we also expected an increase in SXR energy during substrate translation when compared with the case where the substrate was at rest.…”

Section: Dependence On Target Operational Conditionsmentioning

confidence: 99%

Water-window soft X-ray source using cryogenic Ar laser plasma

Amano

2018

Jpn. J. Appl. Phys.

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“…For this reason, our group has been proceeding with the development of a compact soft X‐ray source to replace synchrotron radiation facilities as a laser plasma source. During research and development, our selected target material was xenon (Xe), which produces plasma emission in the 13.5 nm@2% band required for the objective of an EUVL source . However, the newly developed Xe plasma soft X‐ray source has a high efficiency of 30% at 5 nm to 17 nm and reaches a high output of 20 W , so that it is likely to be effective for uses other than the 13.5 nm EUVL.…”

Section: Introductionmentioning

confidence: 99%

Micromachining Using Soft X‐Rays from Laser‐Produced Xe Plasma

Amano

Inoue

Miyamoto

2016

Elect Comm in Japan

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SUMMARY Micromachining of poly(tetrafluoroethylene) (Teflon) and poly(methyl methacrylate) (PMMA) samples was carried out using soft X‐rays from a laser‐produced Xe plasma source, which we developed. In the Teflon sample, the contact angle with a water droplet on a modified surface increased from 90° to 110° as a result of irradiation without a mirror or mask, while the angle decreased to 50° when using irradiation with them. Scanning electron microscopy showed numerous micro‐protuberances and a masked pattern with micro‐concavities on each sample surface. These results suggested that a change to the contact angle was caused by the microstructures on the Teflon surface. We succeeded in controlling the wettability of the Teflon surface, from hydrophobic to hydrophilic, by micromachining using laser plasma X‐rays. In the PMMA sample, the etching rate was investigated with irradiation using a large number of pulses (192,000 pulses) and a low power density of 8 × 104 W/cm2. The etching rate was calculated to be 5 pm/pulse. This was judged to be due only to photo‐etching without any thermal effects. We demonstrated a pure photo‐etching depth of about 1 μm.

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“…In this section, we report our studies carried out to improve the CE at 13.5 nm with 2% bandwidth required for the EUVL source (Amano et al, 2008(Amano et al, , 2010a. To achieve the highest CE, we attempted to control the plasma parameter by changing the driving laser conditions.…”

Section: Conversion Efficiency For Euvlmentioning

confidence: 99%

Laser-Plasma Extreme Ultraviolet Source Incorporating a Cryogenic Xe Target

Amano¹

2011

Recent Advances in Nanofabrication Techniques and Applications

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Characterization of a laser-plasma extreme-ultraviolet source using a rotating cryogenic Xe target

Cited by 15 publications

References 10 publications

Water-window soft X-ray source using cryogenic Ar laser plasma

Water-window soft X-ray source using cryogenic Ar laser plasma

Micromachining Using Soft X‐Rays from Laser‐Produced Xe Plasma

Laser-Plasma Extreme Ultraviolet Source Incorporating a Cryogenic Xe Target

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