2001
DOI: 10.1007/bf02665859
|View full text |Cite
|
Sign up to set email alerts
|

Characterization of a new planar process for implementation of p-on-n HgCdTe heterostructure infrared photodiodes

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2003
2003
2010
2010

Publication Types

Select...
3
1

Relationship

1
3

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 16 publications
0
1
0
Order By: Relevance
“…Several groups have implemented such structure through ion implantation, diffusion, or ion milling on HgCdTe and InAlGaAs/InAlAs superlattice materials. [39][40][41][42][43] A recent study considered Zn diffusion behavior in GaSb for the purpose of fabricating planar P on N antimonide superlattice detectors. 44 Researchers have also studied ways to minimize spatial cross talk and blooming effects, such as using guard rings created by a small doped region between pixels for HgCdTe detectors.…”
Section: Technical Challenges and Potential Solutionsmentioning
confidence: 99%
“…Several groups have implemented such structure through ion implantation, diffusion, or ion milling on HgCdTe and InAlGaAs/InAlAs superlattice materials. [39][40][41][42][43] A recent study considered Zn diffusion behavior in GaSb for the purpose of fabricating planar P on N antimonide superlattice detectors. 44 Researchers have also studied ways to minimize spatial cross talk and blooming effects, such as using guard rings created by a small doped region between pixels for HgCdTe detectors.…”
Section: Technical Challenges and Potential Solutionsmentioning
confidence: 99%