Characterization of a side-type ferrite inductively coupled plasma source for large-scale processing

Hwang²,

et al. 2015

Physics of Plasmas

Self Cite

The electrical characteristics and the spatial distribution of oxygen plasma according to the number of turns in ferrite inductively coupled plasmas (ferrite ICPs) are investigated. Through a new ICP model, which includes the capacitive coupling and the power loss of the ferrite material with the conventional ICP model, the variation of the oxygen discharge characteristics depending on the number of turns is simply understood by the electrical measurement, such as the antenna voltages and the currents. As the number of the turns increases, the capacitive coupling dominantly affects the spatial plasma distribution. This capacitive coupling results in a center focused density profile along the radial direction. In spite of the same discharge conditions (discharge chamber, neutral gas, and pressure), the spatial plasma distribution over 450 mm has drastic changes by increasing number of the turns. In addition, the effect of the negative species to the density profile is compared with the argon discharge characteristics at the same discharge configuration. V C 2015 AIP Publishing LLC. [http://dx.

Section: Introductionsupporting

confidence: 73%

Relationship between the discharge mode and the spatial oxygen plasma distribution in a large size ferrite inductively coupled plasmas

Hwang²,

et al. 2015

Physics of Plasmas

Self Cite

“…13 Each plasma source consists of a U shape quartz tube with two toroidal ferromagnetic cores to make a strong coupling between the antenna and the plasma. In each tube, litz wires of 98 stands are wound around each ferromagnetic core in opposite direction and connected in series to induce a circular electric field along the tube.…”

Section: Methodsmentioning

confidence: 99%

Electron energy flux control using dual power in side-type inductively coupled plasma

2011

Self Cite

Spatial distributions of plasma densities and plasma potentials were measured by the Langmuir probe in the plasma which has eight side sources driven by 400 kHz main power. At low pressure, the energy flux to the chamber from the remote plasma was controlled by 13.56 MHz auxiliary power applied around the center due to the variation of the potential distribution. The energy flux from the side sources toward the chamber led to the synergistic effect on the increase in the center density. The drastic increase in the center density and the decrease in the edge density resulted in the efficient power dissipation for ionization.

“…Therefore, the ferrite module made the ICP source more resistive than that without the ferrite module. In addition, the ferrite module installed on the internal ICP source provides a lower joule loss at the matching network and the ICP source antenna itself due to the lower rf current [8,12]. Even though the rf current on the ICP antenna with the ferrite module is lower than that the ICP antenna without the ferrite module, the time-varying magnetic field between the antenna and the substrate holder was reinforced by the ferrite covering top portion of the antenna shown in Fig.…”

Section: Resultsmentioning

confidence: 99%

Plasma Characteristics of Internal Inductively Coupled Plasma Source with Ferrite Module

Lim

Plasma Chem Plasma Process

Jeon

et al. 2011

Electrical and plasma properties of a U-shaped internal inductively coupled plasma (ICP) source with/without a Ni-Zn ferrite module installed above the ICP antenna were investigated. By installing the ferrite module on the antenna, the increase of plasma density and the decrease of plasma potential could be observed. The increase of plasma density was related to the efficient inductive coupling to the plasma by concentrating the induced magnetic field between the antenna and the substrate. At 800 W of ICP power and 20mTorr Ar, a high density plasma on the order of 4.5 0 10 11 /cm 3 could be obtained.