2012
DOI: 10.1109/led.2012.2209625
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Characterization of Channel-Diameter-Dependent Low-Frequency Noise in Silicon Nanowire Field-Effect Transistors

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Cited by 25 publications
(16 citation statements)
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“…However, if noise is considered, it is also well known that scaling electronic devices down to the nanoscale results in enhanced surface scattering and enhanced noise . The results shown in Figure indicate the opposite . The authors explain the improved noise performance for smaller diameter devices as a result of a special phenomenon called volume inversion, which means that the current flows mostly in the middle of the channel instead of at the edges, resulting in less surface scattering and thus less noise.…”
Section: Low‐frequency Noisementioning
confidence: 97%
See 1 more Smart Citation
“…However, if noise is considered, it is also well known that scaling electronic devices down to the nanoscale results in enhanced surface scattering and enhanced noise . The results shown in Figure indicate the opposite . The authors explain the improved noise performance for smaller diameter devices as a result of a special phenomenon called volume inversion, which means that the current flows mostly in the middle of the channel instead of at the edges, resulting in less surface scattering and thus less noise.…”
Section: Low‐frequency Noisementioning
confidence: 97%
“…Comparison of the normalized current noise power density for silicon nanowire field‐effect transistors ( FET s), showing that as the channel diameter is reduced, the normalized noise power also decreased. This reduction in noise is attributed to a volume inversion effect, where the conducting channel is formed in the middle of the nanowire cross‐section, resulting in less surface scattering …”
Section: Low‐frequency Noisementioning
confidence: 99%
“…It is known that the 1/f low-frequency noise level decreases in smaller channel diameters Si NW FETs. 52 This channel diameter-dependent noise behavior is clarified in terms of the effective oxide trap density and the fraction of electrons near the Si-SiO 2 interface.…”
Section: Random Telegraph Signal Behavior Of Drain Currentmentioning
confidence: 99%
“…6 All the n-type nanowire FETs had the same arsenic doping concentrations of 10 20 cm −3 at the S/D regions with the fixed length (L sd ) of 5 nm. Nanowire channels were lightly-doped with boron of 10 16 cm −3 to concentrate on the impact of arsenic discrete dopants on the RDF effects. 11 All the nanowire FETs had the same physical gate length (L gate ) of 20 nm, SiO 2 thickness (t ox ) of 1 nm, and S/D extension lengths (L EXT ) of 6 nm.…”
mentioning
confidence: 99%
“…R sd values were extracted using Y-function technique, 15 applicable to the nanowire FETs with D NW smaller than 10 nm due to volume inversion effects neglecting surface roughness scattering within the channel regions in the inversion regimes. 16 One example for transfer characteristics and Y-function curves of the nanowire FETs with the D NW of 5 nm and the L j of 0.5 nm/dec in the forward-bias condition was shown in Fig. 2.…”
mentioning
confidence: 99%