Characterization of Chemically Amplified Resists with "Acid Amplifier" for 193 nm Lithography.

4-(tert-Butoxycarbonyloxy)benzylp-toluenesulfonates as acid amplifiers applicable to chemically amplified photoresists

“…3). It follows that the sensitivity enhancement arises from the involvement of the acid proliferation of 2 which is triggered by a photogenerated acidic species, just as in the cases of the other acid amplifiers [17][18][19][20][21][22][23] . The level of the photosensitivity enhancement induced by 2 is not far from the other acid amplifiers developed in this laboratory.…”

“…We have so far developed four kinds of acid amplifiers releasing sulfonic acids; tert-butyl acetoacetate derivatives 16,17) , ketal sulfonates 18) , diol monosulfonates 19) and a trioxane 20) . They all exhibit autocatalytic acidolysis reactions in solution and in polymer films so that photosensitivity enhancement is achieved by their addition to conventional chemically amplified photoresists [21][22][23] . Because of the novelty of this kind of autocatalytic processes, it is of significance to examine the scope and limitation of the acid proliferations from fundamental as well as practical viewpoints.…”

Synthesis of a Trioxane Derivative as an Acid Amplifier and its Application for Photopolymer Systems.

“…A novel concept of acid proliferation has been proposed in our laboratory [1][2][3][4][5]. The concept involves an acid-catalyzed decomposition of an organic compound teased as an acid amplifier which releases another strong organic acid, leading to the autocatalytic decomposition.…”

“…The addition of the acid amplifiers to chemically amplified photoresists consisting of a photoacid generator and an acidlabile polymer resulted in a marked improvement of a contrast, whereas photosensitivity was not much improved [2][3][4][5].…”

“…Several kinds of acid amplifiers such as acetoacetate derivatives [1,2], -sulfonyloxyketone acetal [4], and diol monosulfonate [5] were designed and synthesized.…”