2000
DOI: 10.1016/s0040-6090(00)01090-7
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Characterization of diamond-like carbon (DLC) thin films prepared by r.f. magnetron sputtering

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Cited by 69 publications
(23 citation statements)
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“…DLC film comprises a mixture of sp 2 and sp 3 carbon bonds and is deposited by using high energy carbon species. DLC films are produced by a number of techniques like ion beam deposition, 7 radio frequency plasma enhanced chemical vapor deposition (r.f.-PECVD), 8 filtered cathodic vacuum arc (FCVA), 9 ion plating, 10 plasma immersion ion implantation and deposition (PIIID), 11 magnetron sputtering, 12 ion beam sputtering, 13 pulsed laser deposition, 14 and mass selected ion beam deposition. 15 The hydrogen content in DLC films varies up to 40%.…”
Section: Introductionmentioning
confidence: 99%
“…DLC film comprises a mixture of sp 2 and sp 3 carbon bonds and is deposited by using high energy carbon species. DLC films are produced by a number of techniques like ion beam deposition, 7 radio frequency plasma enhanced chemical vapor deposition (r.f.-PECVD), 8 filtered cathodic vacuum arc (FCVA), 9 ion plating, 10 plasma immersion ion implantation and deposition (PIIID), 11 magnetron sputtering, 12 ion beam sputtering, 13 pulsed laser deposition, 14 and mass selected ion beam deposition. 15 The hydrogen content in DLC films varies up to 40%.…”
Section: Introductionmentioning
confidence: 99%
“…The peak height of CN bonding was found to be enhanced as nitrogen content increases. The absorption band at 2800±3000 cm À1 is identi®ed with C-H stretching vibration, which is attributed to diamond-like carbon ®lm [9,10]. As nitrogen content increased this peak was found to be de enhanced showing that the bonding was more likely to graphitic than diamond-like structure.…”
Section: Ft-ir Spectroscopymentioning
confidence: 99%
“…Hard amorphous carbon, so-called diamond-like carbon, have attracted attention as coating materials alternative to diamond 6,7,8,9) . In particular, nonhydrogenated amorphous carbon (a-C) films deposited by filtered cathodic vacuum arc (FCVA) 8,9) and sputtering 6,7) possess higher hardness than that of hydrogenated amorphous carbon (a-C:H) films prepared by CVD. Hard amorphous carbon films are deposited at low substrate temperatures, and a-C films can be deposited at lower substrate temperatures than a-C:H films prepared by CVD.…”
Section: Introductionmentioning
confidence: 99%