2021 IEEE MTT-S International Microwave and RF Conference (IMARC) 2021
DOI: 10.1109/imarc49196.2021.9714643
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Characterization of GaN HEMT at Cryogenic Temperatures

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Cited by 2 publications
(2 citation statements)
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“…The on-resistance, Ron, decreased from 1.86 Ω.mm at RT to 1.19 Ω.mm at CT. Only a minor shift was observed in the pinch-off voltage, which was around -1.6 V. Also, no significant increase in the maximum current density was observed at CT, even when forward biasing the gate. This behavior differs from the one reported in [8] [16], but could be ascribed to trapping effects becoming more dominant at CT and either located in the AlGaN barrier or surface-related; in line with the results of the cryogenic GaN-HEMTs in [17] and [18]. This is in addition to the potential effects of the buffer traps due to its Fe-doping [19] [20], combined with the slow-down of the emission time of traps at cryogenic temperatures [18] [21].…”
Section: A DC Characterizationsupporting
confidence: 77%
“…The on-resistance, Ron, decreased from 1.86 Ω.mm at RT to 1.19 Ω.mm at CT. Only a minor shift was observed in the pinch-off voltage, which was around -1.6 V. Also, no significant increase in the maximum current density was observed at CT, even when forward biasing the gate. This behavior differs from the one reported in [8] [16], but could be ascribed to trapping effects becoming more dominant at CT and either located in the AlGaN barrier or surface-related; in line with the results of the cryogenic GaN-HEMTs in [17] and [18]. This is in addition to the potential effects of the buffer traps due to its Fe-doping [19] [20], combined with the slow-down of the emission time of traps at cryogenic temperatures [18] [21].…”
Section: A DC Characterizationsupporting
confidence: 77%
“…It will bring higher power density, higher efficiency and superior performances due to higher operation speed, lower power dissipation stemming from reduced voltage, better switching characteristics, shorter transmission times due to lower metal resistance, increased integration density, better digital and analog device/circuit performances [1][2]. In this context, GaN HEMT technology has emerged as a promising candidate in cryogenic power electronics for high frequency and high power microwave applications due their high two dimensional electron gas (2DEG) mobility when operated at very low temperatures [3][4][5][6][7][8][9]. However, although several studies have already been reported about the cryogenic performances of GaN HEMT devices [10][11][12][13], there is still a lack of detailed analysis of the electronic properties of the channel and access regions under cryogenic operation.…”
Section: Introductionmentioning
confidence: 99%