devices, the hurdle should be overcome by identifying the origin. However, the origin of the wide-range ideality factor was not yet been fully elucidated.The ideality factor is a measure of how efficiently an applied bias is delivered to the junction of the device. The ideality factor of GS devices can be influenced by both voltage-independent serial resistance and voltage-dependent attributes such as interface state and quantum capacitance. Thus, one can expect that the ideality factor changes with applied bias voltage.First of all, when a bias voltage is applied to a GS junction, the Fermi level of 2D graphene changes significantly in contrast to typical metal-oxide-semiconductor (MOS) devices due to the far less density of states of graphene compared to that of 3D metal. As a result, the effective Schottky barrier height and the resistance of graphene change with bias voltage. This directly influences the GS device performance and the ideality factor.Second, a peculiar issue related to the GS devices is the un avoidable wet graphene transfer process on a cleaned silicon wafer. During this process, oxidation of silicon occurs naturally. As a result, the GS devices inevitably have a native interfacial oxide layer between graphene and silicon although it may be very thin. This interfacial oxide layer directly influences the performance of GS devices. Although the layer can act as a tunneling barrier, which may enhance the effective potential barrier height, this effect has often been ignored because the layer is thin enough to assume that the transport property is largely governed by the semiconductor rather than limited by the tunneling.Third, the truncated silicon surface has high density of surface states. The surface states can exist as interface states of GS devices. The interface states can be equilibrated with silicon itself or with the graphene and this depends on the thickness of the interfacial oxide layer. Due to the very thin native oxide layer, one can expect that the silicon interface state can be mostly equilibrated with graphene rather than silicon itself. But this has not been confirmed yet.In this study, first we extract the voltage-dependent ideality factors of graphene-silicon Schottky diodes from their I-V characteristics based on Schottky emission theory. [13][14][15] We then compare the ideality factors with those obtained from the impedance spectra. [16,17] We designed an equivalent circuit model for analysis of impedance spectra accounting for Undoubtedly graphene-silicon (GS) heterostructure devices will play significant roles as future rectifiers, potential barrier modulators, photodetectors, photovoltaic devices, biochemical sensors, and so on. However, typical GS devices suffer from unusually wide-range voltage-dependent high ideality factors (η = 1.1-33.5). To overcome this hurdle, the origin of this wide-range voltage-dependent ideality factor should first be identified but this has not yet been fully studied. This study focuses on identifying the origin using impedance spectroscop...