2013
DOI: 10.1587/transele.e96.c.718
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Characterization of Local Electronic Transport through Ultrathin Au/Highly-Dense Si Nanocolumnar Structures by Conducting-Probe Atomic Force Microscopy

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Cited by 5 publications
(2 citation statements)
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“…In our previous work, we succeeded in the fabrication of multiple-stacked Siquantum-dots (Si-QDs) layers with ultrathin SiO2 interlayers by repeating low-pressure chemical vapor deposition (LPCVD) using pure SiH4 and dry O2 thermal oxidation (12)(13). Recently, we also demonstrated electron emission from diodes with multiple-stacked Si-QDs structures under biases of 6V and over, in which electric field is concentrated the upper dot layers as evaluated by hard X-ray photoelectron spectroscopy (14)(15)(16)(17)(18)(19). To enhance electron emission efficiency, one major issue regarding the electron emission device application of the multiple-stacked Si-QDs is minimizing electron scattering at top electrodes.…”
Section: Introductionmentioning
confidence: 99%
“…In our previous work, we succeeded in the fabrication of multiple-stacked Siquantum-dots (Si-QDs) layers with ultrathin SiO2 interlayers by repeating low-pressure chemical vapor deposition (LPCVD) using pure SiH4 and dry O2 thermal oxidation (12)(13). Recently, we also demonstrated electron emission from diodes with multiple-stacked Si-QDs structures under biases of 6V and over, in which electric field is concentrated the upper dot layers as evaluated by hard X-ray photoelectron spectroscopy (14)(15)(16)(17)(18)(19). To enhance electron emission efficiency, one major issue regarding the electron emission device application of the multiple-stacked Si-QDs is minimizing electron scattering at top electrodes.…”
Section: Introductionmentioning
confidence: 99%
“…In this work, to get an insight into ballistic electron transport through self-aligned Si-QDs, we extended our research work to the spatially-resolved characterization of electron emission from self-aligned Si-QDs formed on ultrathin SiO 2 /n-Si(100) by using a conductive cantilever [9].…”
Section: Introductionmentioning
confidence: 99%