Characterization of Mo/Si multilayer growth on stepped topographies

Boogaard, A. J. R. van den; Louis, Eric; Zoethout, E.; Goldberg, Kenneth A.; Bijkerk, Frederik

doi:10.1116/1.3628640

Cited by 3 publications

(3 citation statements)

References 18 publications

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“…The wavelength dependency of the PsR-VUV reflectance closely approaches the combined average reflectance of the two reference samples [Fig. 2(a), solid line], advocating a negligible influence of structural deformations near the edges of the add-multilayer, as is in line with reference [12]. Although the data indicate not yet fully optimized reflectance values for none of the two reference systems, an absolute near zeroth-order efficiency of 64% in the EUV wavelength range is the highest reported up till now for any type of reflective wavelength separator, to the best knowledge of the authors.…”

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confidence: 74%

Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

et al. 2012

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A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, λ=13.5 nm) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of λ>100 nm out-of-band radiation in EUV lithography.

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confidence: 74%

Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

et al. 2012

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“…Edge rounding effects lead to non perfect periodicity of the multilayer near the edges of the grating facets. As it was studied with transmission electron microscopy in detail in our previous work, the width of this distorted area scales with the thickness/aperture ratio of the deposition contact mask, and with the angular anisotropy of the deposition flux [29]. Therefore the EUV reflectance loss could be minimized by employing lower mask thickness/aperture ratios, but in practice this requires increased pitch lengths [7].…”

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confidence: 99%

Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors

Медведев¹,

Boogaard²,

Meer³

et al. 2013

Opt. Express

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We report on the development of a hybrid mirror realized by integrating an EUV-reflecting multilayer coating with a lamellar grating substrate. This hybrid mirror acts as an efficient Bragg reflector for extreme ultraviolet (EUV) radiation at a given wavelength while simultaneously providing spectral-selective suppression of the specular reflectance for unwanted longer-wavelength radiation due to the grating phase-shift resonance. The test structures, designed to suppress infrared (IR) radiation, were fabricated by masked deposition of a Si grating substrate followed by coating of the grating with a Mo/Si multilayer. To give the proof of principle, we developed such a hybrid mirror for the specific case of reflecting 13.5 nm radiation while suppressing 10 μm light, resulting in 61% reflectance at the wavelength of 13.5 nm together with the 70 × suppression rate of the specular reflection at the wavelength of 10 μm, but the considered filtering principle can be used for a variety of applications that are based on utilization of broadband radiation sources.

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“…We note that close to the edges of the Fresnel zones the multilayer period may deviate from its intended value, which would cause some EUV loss. However, it shows that the surface fraction of these edges and therefore also the according loss is very small, in the range of 1% [21]. Improved deposition techniques are available that further reduce this fraction [22].…”

Section: Calculation Of Fresnel Zone Patternmentioning

confidence: 99%

Spectral purification and infrared light recycling in extreme ultraviolet lithography sources

Bayraktar¹,

Goor²,

Boller³

et al. 2014

Opt. Express

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We present the design of a novel collector mirror for laser produced plasma (LPP) light sources to be used in extreme ultraviolet (EUV) lithography. The design prevents undesired infrared (IR) drive laser light, reflected from the plasma, from reaching the exit of the light source. This results in a strong purification of the EUV light, while the reflected IR light becomes refocused into the plasma for enhancing the IR-to-EUV conversion. The dual advantage of EUV purification and conversion enhancement is achieved by incorporating an IR Fresnel zone plate pattern into the EUV reflective multilayer coating of the collector mirror. Calculations using Fresnel-Kirchhoff's diffraction theory for a typical collector design show that the IR light at the EUV exit is suppressed by four orders of magnitude. Simultaneously, 37% of the reflected IR light is refocused back the plasma.

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Characterization of Mo/Si multilayer growth on stepped topographies

Cited by 3 publications

References 18 publications

Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

Infrared diffractive filtering for extreme ultraviolet multilayer Bragg reflectors

Spectral purification and infrared light recycling in extreme ultraviolet lithography sources

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