2011
DOI: 10.1149/1.3630858
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Characterization of Semiconductor Surfaces during Surface Conditioning and Functionalization

Abstract: Semiconductor surface cleaning, passivation and functionalization are critical steps for applications such as microelectronics, MEMS, sensors, and solar energy harvesting. Progress has relied in part on the development of surface chemical treatments. However, the ability to characterize surfaces at all steps of processing has also been essential and will be emphasized here. This work focuses on the chemical modification of oxide-free, hydrogen-passivated silicon, including wet chemical treatments, atomic layer… Show more

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