1996
DOI: 10.1016/0039-6028(96)00824-2
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Characterization of single-crystalline Al films grown on Si(111)

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Cited by 18 publications
(6 citation statements)
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“…Al films can be epitaxially grown on 7 × 7 reconstructed Si(111) [ 9 ]. In this work, Si(111) wafers with resistivity of 8 to 12 Ωm were used as a substrate.…”
Section: Methodsmentioning
confidence: 99%
“…Al films can be epitaxially grown on 7 × 7 reconstructed Si(111) [ 9 ]. In this work, Si(111) wafers with resistivity of 8 to 12 Ωm were used as a substrate.…”
Section: Methodsmentioning
confidence: 99%
“…Al films were grown epitaxially on 7 × 7 reconstructed Si(111) [20]. In our work, Si(111) wafers with resistivity 8-12 m were used as a substrate.…”
Section: Methodsmentioning
confidence: 99%
“…There are two symmetrically equivalent orientations, and this leads to twin defects that prevent the fabrication of atomically smooth films. Molecular beam epitaxy of Al on Si (111) in [ 5 ], GaAs(001) in [ 6 ], and Al 2 O 3 in [ 7 ] is usually fabricated at a substrate temperature of about 750 °C with an RMS surface roughness down to 1 nm. In fact, peak-to-peak roughness is very important for the fabrication of tunnel heterostructures, which determines the density of the main defects and their strength.…”
Section: Fabricationmentioning
confidence: 99%