Characterization of SnO₂:F thin films deposited by an economic spray pyrolysis technique

Abstract

Fluorine doped tin oxide (FTO) semiconductor thin films were deposited on glass substrates using spray pyrolysis technique and the effect of fluorine (F‐) doping (varying 0‐30 at%) is explored. X‐ray diffraction studies confirmed the tetragonal structure with polycrystalline nature. The crystallinity of undoped films is enhanced with the increase in F‐doping. The films doped with 25 at% F show a strong orientation along (101) plane. The grain size of the undoped films (214 nm) is increased with the increase in F‐doping level to reach a maximum of 415 nm (25 at% F). A minimum sheet resistance of ∼5.4 Ω/□ obtained for the 30 at% F doped films is among the lowest reported values. The average visible transmittance (400‐700 nm) of the undoped films (61.4%) is increased with the increasing F‐doping to reach a maximum of 74.5% (25 at%. F). The films doped with 25 at.% F showed high value of figure of merit (4.55 × 10‐3 Ω‐1). The obtained results authenticate the influence of F‐doping on the properties of the deposited films. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

Structural and Electrical Properties of SnO2:F Thin Films Prepared by Chemical Vapor Deposition Method

“…This is probably resulting in an increase in free electrons and decreases the value of R sh . At higher doping concentrations the sheet resistance increases which is probably suggesting that the excess F atoms do not occupy the proper lattice positions, and at the same time may increase the structural disorder [16,38]. Compared to other dopants such as antimony, the minimum sheet resistance of 8 Ω/ for a 3% doping has achieved [19].…”

“…TCOs are generally manufactured as undoped and doped form of indium oxide (In 2 O 3 ), tin oxide (SnO 2 ), zinc oxide (ZnO) and cadmium oxide (CdO) which show high visible transmittance, high electrical conductivity, and high near IR reflectivity which is applicable in energy conserving [15]. Tin oxide thin films are well-known for their economical production and stability towards atmospheric conditions [16]. Traditionally, tin oxide is doped to improve its expected properties by some dopants such as indium [17,18], antimony [19], palladium [20], cobalt [21] and fluorine.…”

Toward Finding a Commercial Method for Deposition of Nanostructured SnO2Thin Films

“…A series of other sources especially organic compounds with butyl groups and/or acetate groups such as TBT [19], TBTA [20], DBTDA [21] were reported to form SnO 2 lms. However, SnCl 2 is one of the best precursors because of ease of synthesizing in the laboratory and economic considerations [22].…”

Preparation, Study and Nanoscale Growth of Indium Oxide Thin Films

“…Thin lms of In 2 O 3 can be prepared by a variety of techniques such as chemical vapour deposition [7], spray pyrolysis [8], vacuum evaporation [9], and magnetron sputtering [10]. Among these techniques, the chemical spray pyrolysis technique is one of the most commonly used techniques for preparation of transparent and conducting oxides owning to its simplicity, non-vacuum system of deposition, and hence inexpensive method.…”