Characterization of sputtered Ta-C-N film in the Cu/barrier/Si contact system

Wang, Shui Jinn; Tsai, Hsin-yi Sandy; Sun, Shi-Chung; Shiao, Ming‐Hua

doi:10.1007/bf02657711

Cited by 10 publications

(5 citation statements)

References 15 publications

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“…Although TaN is not as resistant to abrasion as TiN, it shows extremely low friction against both steel and alumina [9]. TaC x N y has further advantages over TiC and TiN because its chemical stability is superior to that of TaC or TaN [10]. The blood compatibility of TaN films was shown to be better than those of TiN and Ta [11].…”

Section: Introductionmentioning

confidence: 93%

Ta-doped multifunctional bioactive nanostructured films

Shtansky

Gloushankova

Sheveiko

et al. 2008

Surface and Coatings Technology

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Section: Introductionmentioning

confidence: 93%

Ta-doped multifunctional bioactive nanostructured films

Shtansky

Gloushankova

Sheveiko

et al. 2008

Surface and Coatings Technology

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“…Because they have approximately the same lattice parameters. In addition, TiC and TiN phases have nearly the same crystal form (fcc) and almost the same lattice parameter (Wang et al , 2001), as well as a similar radius for the C and N atoms, which makes it difficult to distinguish them. Therefore, the TaC and TaN phases are difficult to distinguish.…”

Section: Resultsmentioning

confidence: 99%

Microstructure, mechanical and tribological properties of Ta(C, N) coatings deposited on TA15 substrates with different nitrogen partial pressure

Miao

Liang

et al. 2022

ILT

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Purpose The purpose of this paper is to obtain the optimal N2/Ar ratio parameters for preparing Ta (C, N) coating. Three coatings with different N2/Ar ratios were prepared on the TA15 substrate, and their effects on the wear properties of the coatings were discussed. Design/methodology/approach Ta(C, N) coatings with three different N2/Ar ratios were prepared on TA15 substrates using the double cathode glow metallurgical plasma alloying technique (DGMPA) using a step-by-step diffusion method. Findings With the increase of N2/Ar flow ratio, the hardness and elastic modulus of the coating first increase and then decrease. Compared with the S1 sample (N2/Ar gas ratio 25: 75) and the S3 sample (N2/Ar gas ratio 75: 25), the S2 sample (N2/Ar gas ratio 50: 50) has better mechanical properties, with hardness increased by 48.45% and 6.8%, respectively, and elastic strain ratio increased by 22.8% and 28.5%, respectively. Moreover, the wear degree of the S2 sample is less than other samples. The wear rate of the S2 sample was 32.4% lower than the S3 sample at 300°C and 14.3% lower than the S3 sample at 500°C. Therefore, the S2 sample has the best mechanical properties and the best high temperature wear resistance. Originality/value Ta(C, N) coatings were prepared by DGMPA technology, and the wear mechanism of Ta(C, N) coatings with different N2/Ar ratios was investigated to reduce the wear rate.

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“…More recently, TM carbonitrides (TMCNs) were produced by various groups and were found to potentially have better properties than their binary counterparts. Some of the TMCNs that were reported in the literature include Ti-C-N [4][5][6], Cr-C-N [7,8], Zr-C-N [9], and Ta-C-N [10].…”

Section: Introductionmentioning

confidence: 99%

“…This paper reports on an investigation of TaC x N y films deposited by reactive unbalanced magnetron sputtering. The TaC x N y films that were reported in the literature were fabricated as a potential diffusion barrier for copper metallization [10]. The main result of the study was that the thermal stability and chemical inertness of TaC x N y was superior to that of TaN or TaC.…”

Section: Introductionmentioning

confidence: 99%

Physical and chemical properties of sputter-deposited TaC_xN_yfilms

Aouadi¹,

Zhang²,

Basnyat³

et al. 2006

J. Phys.: Condens. Matter

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The structural, electronic, optical, and mechanical properties of stoichiometric TaC(x)N(y = 1-x) were simulated using an ab initio calculation based on density functional theory (DFT) within the generalized gradient approximation. The calculations revealed the theoretical lattice parameter, density of states, refractive index, and elastic constants as a function of carbon and nitrogen content. TaC(x)N(y) films were subsequently produced on Si wafers using unbalanced magnetron sputtering. The structural, optical, and mechanical properties were measured using x-ray diffraction/transmission electron microscopy, vacuum ultraviolet spectroscopic ellipsometry, and nanoindentation, respectively. The computational and experimental properties were compared. The lattice parameter, the energy of the 2p bands in the density of states, and the energy of the interband transitions were found to decrease with increasing C content. No significant changes in the elastic constants were observed as a result of substituting N atoms with C atoms. The hardness and the elastic modulus were in the 40 and 380 GPa range, respectively. The experimental Young's modulus was much smaller than the computational one and this discrepancy was attributed to the nanocrystalline nature of the films. Also, the elastic constants were found to decrease dramatically for over-stoichiometric films.

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Characterization of sputtered Ta-C-N film in the Cu/barrier/Si contact system

Cited by 10 publications

References 15 publications

Ta-doped multifunctional bioactive nanostructured films

Ta-doped multifunctional bioactive nanostructured films

Microstructure, mechanical and tribological properties of Ta(C, N) coatings deposited on TA15 substrates with different nitrogen partial pressure

Physical and chemical properties of sputter-deposited TaC_xN_yfilms

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Characterization of sputtered Ta-C-N film in the Cu/barrier/Si contact system

Cited by 10 publications

References 15 publications

Ta-doped multifunctional bioactive nanostructured films

Ta-doped multifunctional bioactive nanostructured films

Microstructure, mechanical and tribological properties of Ta(C, N) coatings deposited on TA15 substrates with different nitrogen partial pressure

Physical and chemical properties of sputter-deposited TaCxNyfilms

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Physical and chemical properties of sputter-deposited TaC_xN_yfilms