Proceedings of the 25th Edition on Great Lakes Symposium on VLSI 2015
DOI: 10.1145/2742060.2742074
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Characterization of SWCNT Bundle Based VLSI Interconnect with Self-heating Induced Scatterings

Abstract: Performance of single walled carbon nanotube (SWCNT) bundle-based VLSI interconnects has been studied under the strong influence of scatterings induced by self-heating. Landauer Büttiker formalism along with Fourier heat transfer equation have been used to compute interconnect scattering parameters at various cross sectional areas of the interconnection. Cross sectional temperature calculation was performed using finite difference method considering temperature dependent thermal conductivity for primitive defe… Show more

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Cited by 5 publications
(2 citation statements)
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“…However, it must be noted that the resistance of a CNT interconnect is dependent on the ambient temperature as well, which is not included in (1). Further, the joule heating dynamics of the CNT interconnects shows the current density that is dependent on the change in ambient temperature as expressed by [8][9][10]. (2) where, ΔT is the local CNT temperature at x measured from the ambient temperature, J is the current density along the CNT and a is the dissipation factor having the units of inverse length and b = 1/kσ (k is thermal conductivity and σ is electrical conductivity of CNT).…”
Section: Cnt/air-gap Interconnectsmentioning
confidence: 99%
“…However, it must be noted that the resistance of a CNT interconnect is dependent on the ambient temperature as well, which is not included in (1). Further, the joule heating dynamics of the CNT interconnects shows the current density that is dependent on the change in ambient temperature as expressed by [8][9][10]. (2) where, ΔT is the local CNT temperature at x measured from the ambient temperature, J is the current density along the CNT and a is the dissipation factor having the units of inverse length and b = 1/kσ (k is thermal conductivity and σ is electrical conductivity of CNT).…”
Section: Cnt/air-gap Interconnectsmentioning
confidence: 99%
“…For very large scale integration (VLSI), in scaled CMOS technology nodes, existing copper-based interconnect is facing challenges due to excessive heating, electro-migration, and other performance degradation (1)(2)(3). In this regard, graphene (G) and carbon nanotubes (CNT) have been studied extensively because of their excellent electrothermal properties (4)(5)(6)(7)(8)(9)(10). Since graphene and CNT have their own limitations in integrating with present CMOS technology, there is ongoing research to find hybrid materials, which can have simultaneously better thermal and electrical conductivity (11).…”
Section: Introductionmentioning
confidence: 99%