2004
DOI: 10.1016/j.msea.2004.03.096
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Characterization of (Ti, Al)N films prepared by ion mixing and vapor deposition

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Cited by 14 publications
(6 citation statements)
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“…In general, TiAlSiN coatings are deposited by physical vapor deposition (PVD) method and have been synthesized by reactive magnetron sputtering, cathodic arc ion plating, ion beam sputtering plating and ion mixing and vapor deposition . But each deposition technology mentioned above has its intrinsic weakness, such as bad surface quality, coating material limit or low ionization.…”
Section: Introductionmentioning
confidence: 99%
“…In general, TiAlSiN coatings are deposited by physical vapor deposition (PVD) method and have been synthesized by reactive magnetron sputtering, cathodic arc ion plating, ion beam sputtering plating and ion mixing and vapor deposition . But each deposition technology mentioned above has its intrinsic weakness, such as bad surface quality, coating material limit or low ionization.…”
Section: Introductionmentioning
confidence: 99%
“…In addition to sputtering, PVD is also used in combination with ion irradiation, known as ion mixing and vapor deposition (IVD), which can easily change and design the physical and chemical properties of thin films. For example, Uchida et al [34] used the IVD technique to prepare Titanium aluminum nitride (Ti, Al)N films by depositing Ti and Al metal vapor under simultaneous irradiation N ions. And Liu et al [29] also successfully prepared a novel quaternary (Ti, Al, Zr)N coating on Si3N4 ceramic substrates by using PVD technology and multi-arc ion plating technique.…”
Section: Physical Synthetic Methodsmentioning
confidence: 99%
“…As is well known, A1N sputtering yields a film that has pinholes and so is not electrically isolating. To solve this problem, all AlN films that were prepared under the various conditions in this investigation were of satisfactory quality and had a smooth surface, although they did contain some pinhole defects [ 10 ]. After the electrical conductivity was tested, their isolating property was confirmed.…”
Section: Fabrication Of Flexible Micro Sensorsmentioning
confidence: 99%