2008
DOI: 10.1016/j.apsusc.2007.12.022
|View full text |Cite
|
Sign up to set email alerts
|

Characterization of Ti–Zr–N films deposited by cathodic vacuum arc with different substrate bias

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

1
12
0

Year Published

2010
2010
2018
2018

Publication Types

Select...
8
1

Relationship

0
9

Authors

Journals

citations
Cited by 38 publications
(13 citation statements)
references
References 26 publications
1
12
0
Order By: Relevance
“…Due to imperfections of the substrate polishing, which is reproduced in the coatings, there is scattering of the data. Nevertheless, the nanohardness data in Table 1 match the reported ones in the literature [1,[46][47][48] and this finding is a basic premise of the current investigation. For an additional comparison, the typical nanohardness for mild steel does not exceed 2-3 GPa.…”
Section: Xrd Tem and Mechanical Characterization Of Sputtered Coatinsupporting
confidence: 91%
See 1 more Smart Citation
“…Due to imperfections of the substrate polishing, which is reproduced in the coatings, there is scattering of the data. Nevertheless, the nanohardness data in Table 1 match the reported ones in the literature [1,[46][47][48] and this finding is a basic premise of the current investigation. For an additional comparison, the typical nanohardness for mild steel does not exceed 2-3 GPa.…”
Section: Xrd Tem and Mechanical Characterization Of Sputtered Coatinsupporting
confidence: 91%
“…We already mentioned the indication for such variation in the XRD diagrams of our samples. An increase of nanohardness with negative bias potential was observed in TiN films deposited by cathodic vacuum arc deposition with different substrate bias [46]. Similar behavior was observed for Zr-Si-N thin films deposited at substrate temperature 510 K [45] and the increment of nanohardness was about 8 GPa when the bias was increased from 0 to −150 V. It was stated there [45] that increased hardness cannot be attributed to the residual stress in the films deposited at 510 K. It was found also that nanoindentation measurement cannot reflect the variation of residual stress in TiN films deposited at 300°C and 500°C [47].…”
Section: Xrd Tem and Mechanical Characterization Of Sputtered Coatinmentioning
confidence: 90%
“…Scratch test is generally considered as one of the simple means in assessing adhesion strength of a film on its substrate [69][70][71]. Additionally, it has been widely used to evaluate the bonding strength [72] and tribological behaviors (friction and wear) of thin films [73,74]. The nanoscratch technique provides a simple, versatile and rapid means to assess the scratch wear resistance among the techniques available to evaluate the nanotribological properties of thin films.…”
Section: Scratchingmentioning
confidence: 99%
“…At the same time, nanoscratch techniques have been widely used to evaluate the bonding strength [20] and tribological behaviors of friction layers [21]. Hence, the FEM and nanoindentation are used to investigate the tribological property of friction layers in this paper.…”
Section: Introductionmentioning
confidence: 99%