Characterization of TiN thin films grown by low-frequency (60 Hz) plasma enhanced chemical vapor deposition

Kim, Hong Tak; Kim, Maeng Jun; Sohn, Sang Ho

doi:10.1016/j.jpcs.2012.02.024

Cited by 13 publications

(5 citation statements)

References 16 publications

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“…It crystallizes into well-known rock-salt structure. Titanium nitride and its derivatives have many remarkable properties and good potential applications, such as chemical stability, thermal stability, oxidative resistance, good adhesion to the substrate, high fracture toughness and high hardness [1][2][3][4][5]. TiN is one of the most important metal cutting tools and coating materials for surface protection due to its extreme hardness, high melting temperature, and excellent corrosion resistance [6].…”

Section: Introductionmentioning

confidence: 99%

Investigations on structural, elastic, thermodynamic and electronic properties of TiN, Ti2N and Ti3N2 under high pressure by first-principles

Yang

Zhu

Wei

et al. 2016

Journal of Physics and Chemistry of Solids

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Section: Introductionmentioning

confidence: 99%

Investigations on structural, elastic, thermodynamic and electronic properties of TiN, Ti2N and Ti3N2 under high pressure by first-principles

Yang

Zhu

Wei

et al. 2016

Journal of Physics and Chemistry of Solids

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“…4(a) and 4(b), the yellow and blue surfaces feature sparse and dense nanowires, respectively. According to previous report, the titanium nitride usually shows the nanoparticle shape [13,14] while the titanium oxide tends to form nanowires. [15,16] Then it is reasonable to assign the nanowires as TiO 2 and the rough substrate as TiN or Ti 2 N (labeled by arrows).…”

Section: Characterizationsmentioning

confidence: 86%

Effect of trace oxygen on plasma nitriding of titanium foil

Zhou 周,

Xiong 熊,

Ma 马

et al. 2024

Chinese Phys. B

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Titanium nitride films are prepared by plasma enhanced chemical vapor deposition method on titanium foil using N2 as precursor. In order to evaluate the effect of oxygen on the growth of titanium nitride films, a small amount of O2 is introduced into the preparation process. The study indicates that trace O2 addition into the reaction chamber gives rise to significant changes on the color and micro-morphology of the foil, featuring dense and long nano-wires. The as-synthesized nanostructures are characterized by various methods and identified as TiN, Ti2N and TiO2 respectively. Moreover, the experiment results show that oxide nanowire has a high degree of crystallinity and the nitrides present specific orientation relationships with the titanium matrix.

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“…Kim et al also reported the growth of a-C:H films on glass substrates at room temperature and acquired crack-free films [35]. In addition, wear-resistant depositions, including TiN and TiC films, were performed at relatively low temperatures (350-500 • C), and the resulting films exhibited good properties [36][37][38][39][40]. However, the film depositions using CF-PECVD were not applied to polymer substrates.…”

Section: Plasma Characterizations and Properties Generated Using Cf P...mentioning

confidence: 99%

“…In addition, a CF power source has a very simple and easily made design, which is inexpensive to build. However, CF-derived plasma processes have not been widely used despite their many advantages, and studies have been performed by very few groups and focused on film depositions using plasma-enhanced chemical vapor deposition [25][26][27][28][29][30][31][32][33][34][35][36][37][38][39][40]. Recently, CF-derived discharge has been applied not only to low-pressure discharge but also to atmospheric discharge.…”

Section: Introductionmentioning

confidence: 99%

Review of Plasma Processing for Polymers and Bio-Materials Using a Commercial Frequency (50/60 Hz)-Generated Discharge

et al. 2023

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This manuscript introduces the properties and diverse applications of plasma generated using commercial frequencies of 50/60 Hz. Commercial frequency (CF) derived plasma exhibits characteristics similar to DC discharge but with an electrical polarity and a non-continuous discharge. Due to the low-frequency nature, the reactor configurations usually are capacitively coupled plasma type. The advantages of this method include its simple power structure, low-reaction temperature, and low substrate damage. The electrical polarity can prevent charge buildup on the substrates and deposited films, thereby reducing substrate damage. The simple, low-cost, and easy-to-operate power structure makes it suitable for laboratory-scale usage. Additionally, the various applications, including plasma-enhanced vapor deposition, sputtering, dielectric barrier discharge, and surface modification, and their outcomes in the CF-derived plasma processes are summarized. The conclusion drawn is that the CF-derived plasma process is useful for laboratory-scale utilization due to its simplicity, and the results of the plasma process are also outstanding.

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Characterization of TiN thin films grown by low-frequency (60 Hz) plasma enhanced chemical vapor deposition

Cited by 13 publications

References 16 publications

Investigations on structural, elastic, thermodynamic and electronic properties of TiN, Ti2N and Ti3N2 under high pressure by first-principles

Investigations on structural, elastic, thermodynamic and electronic properties of TiN, Ti2N and Ti3N2 under high pressure by first-principles

Effect of trace oxygen on plasma nitriding of titanium foil

Review of Plasma Processing for Polymers and Bio-Materials Using a Commercial Frequency (50/60 Hz)-Generated Discharge

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