Characterization of UV6 photoresist stabiliztion and implant masking for exclusive implementation in 180-nm device processing

Lysaght, Patrick; Nguyen, B.; Bersuker, G.; Bennett, Joe; Hare, Tony; Doros, Theodore G.; Beach, James V.

doi:10.1117/12.388364

Cited by 1 publication

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“…Environmentally stable chemically amplified photoresists (ESCAPs) are a class of well-established positive photoresists commercialized for 248 nm Deep Ultraviolet Lithography (DUVL) [4][5][6]. The ester-containing resists are considered environmentally stable as the ester functional groups do not self-disassociate under ambient conditions.…”

Section: Introductionmentioning

confidence: 99%

Controlled sequence peptoids as photoresist platforms for high-resolution DUV/EUV photoresists

Meng

Käfer

Wallraff³

et al. 2022

International Conference on Extreme Ultraviolet Lithography 2022

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Achieving commercial viability for extreme ultraviolet lithography (EUVL) demands a homogeneous polymeric materials platform for fine pattern microelectronics. However, current polymer systems possess a heterogeneity length scale larger than the 13.5 nm range desired for EUVL leading to line-edge roughness close to the size of a single polymer molecule in less than a nanometer. In this report, we develop polypeptoids in a high-yielding polymer synthesis with low stochastics and enable a high sensitivity environmentally stable chemically amplified photoresist (ESCAP) for large-scale manufacturing using DUV/EUVL. Polypeptoids are bio-inspired, sequence-defined polymers that minimize molecular size and compositional and sequence statistics. Functional monomers, such as photosensitizers, solubility switches, etchresistant units, and Tg modulators, have been programmed to be precisely distributed into the polymer structure using a robotic synthesizer. Positive-tone polypeptoids ESCAPs can thus be tuned via chemical and sequence design. In particular, the arrangement of solubility-switch functional groups relative to adhesion-promoting groups influences synthetic yield and lithographic patternability. Other functional groups, such as phenolic and aromatic, promote a resist's physical properties, film quality, adhesive characteristics, and pattern development by tuning the polymer's polarity, depending on the sequence within the polymer chain. This work bridges the materials design of bioinspired polymers, high throughput manufacturing techniques, and nanolithography enabling polymer uses with high processing fidelity for nanotechnologies.

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Section: Introductionmentioning

confidence: 99%