Characterization of W Films on Si and SiO2/Si Substrates  by X-Ray Diffraction, AFM and Blister Test Adhesion Measurements

Bosseboeuf, Alain; Dupeux, M.; Boutry, Mathilde; Bourouina, Tarik; Bouchier, D.; Débarre, D.

doi:10.1051/mmm:0199700804-5026100

Cited by 20 publications

(11 citation statements)

References 17 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The adhesion energy of the PEEK membrane on its silicon support can be estimated from the blister-test experiment [22]. In a similar configuration to the bulge test, we measured the pressure level needed to the decohesion of the membrane from its periphery.…”

Section: Adhesion Energymentioning

confidence: 99%

Microvalves for Natural-Gas Analysis With Poly Ether Ether Ketone Membranes

Nachef

Bourouina

Marty

et al. 2010

J. Microelectromech. Syst.

Self Cite

View full text Add to dashboard Cite

We present the use of poly ether ether ketone (PEEK) as a membrane material for a new type of gas microvalve, which is suitable for the harsh environments of natural gas. The design, fabrication, and experimental characterization of the PEEK-based microvalves are presented first, revealing leakage levels of less than 230 nL · min −1 under nitrogen and helium. Then, the main mechanical properties of the PEEK membranes are derived from both static and dynamic measurements, leading to a Young's modulus of 3.1 GPa and an inplane anisotropic stress field, with both tensile and compressive components in two perpendicular directions and whose magnitudes are +33.9 MPa and −6.8 MPa, respectively. A blister test gave an adhesion energy estimated between 61 and 158 J · m −2 . Finally, temperature cycles have been conducted on the microvalve, showing a resistance of up to 300 • C, together with an improved closing of the membrane. [2010-0062] Index Terms-Membrane, micro-gas chromatography, microvalves, poly ether ether ketone (PEEK).

show abstract

Section: Adhesion Energymentioning

confidence: 99%

Microvalves for Natural-Gas Analysis With Poly Ether Ether Ketone Membranes

Nachef

Bourouina

Marty

et al. 2010

J. Microelectromech. Syst.

Self Cite

View full text Add to dashboard Cite

show abstract

“…Above a critical pressure, the film might debond from the substrate before breaking. The determination of this critical pressure 23,24 or better, the measurement of P(h) 16,[25][26][27][28] or pressure versus time 29 during the interfacial crack growth, is called the blister test. The P(h) curve is an hyperbola from which the interfacial fracture toughness can be quantified 16,[25][26][27][28] .…”

Section: Introductionmentioning

confidence: 99%

“…The determination of this critical pressure 23,24 or better, the measurement of P(h) 16,[25][26][27][28] or pressure versus time 29 during the interfacial crack growth, is called the blister test. The P(h) curve is an hyperbola from which the interfacial fracture toughness can be quantified 16,[25][26][27][28] . The blister test method was first proposed by Danneberg 23 and was subsequently applied to a large variety of systems such as paints 30 , adhesive 24,29,31 ,and thin deposited films 16,[25][26][27][28]32 .…”

Section: Introductionmentioning

confidence: 99%

“…The P(h) curve is an hyperbola from which the interfacial fracture toughness can be quantified 16,[25][26][27][28] . The blister test method was first proposed by Danneberg 23 and was subsequently applied to a large variety of systems such as paints 30 , adhesive 24,29,31 ,and thin deposited films 16,[25][26][27][28]32 . In both techniques, an accurate measurement of the true membrane central deflection is needed.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

<title>Automated interferometric system for bulge and blister test measurements of micromachined membranes</title>

Yahiaoui

Danaie

Petitgrand

et al. 2001

Microsystems Engineering: Metrology and Inspection

Self Cite

View full text Add to dashboard Cite

An experimental set-up designed for the mechanical characterization of small-size membranes by the bulge test and blister test techniques is described. The differential pressure (0-10 bars) is applied to the membrane with a motorized microsyringe pump filled with water to minimize stored elastic energy in the system. An interferometric microscope equipped with a quasi monochromatic Na discharge lamp, a CCD camera and an apertured photomultiplier is used to get simultaneously full field interferograms of the membrane deformed shape and a point measurement of the membrane central height variation. Phase extraction by FFT and unwrapping of the photomultiplier output signal, and processing of some pixels corresponding to the substrate in the set of interferograms images allows to get, with an accuracy in the 3-30 nm range, the true membrane maximum deflection corrected from substrate bending, vertical drift and tilting. 2D or 3D profiles of the membrane deformed shape can as well be obtained with a similar accuracy and a spatial resolution of 3 µm. The good performances of the system are illustrated from measurements on micromachined Si 3 N 4 and Mo membranes on silicon.

show abstract

“…This method allows to measure the surface topography and determine the dimensions of the structures in the subatomic resolution [1]. Due to its properties, it can be applied to the measurement of conductors and semiconductor surfaces prepared in various processes.…”

Section: Afm Characterization Of Sno2 Thin Films Obtained By Magnetromentioning

confidence: 99%

Charakterystyka AFM cienkich warstw SnO2 uzyskanych podczas sputteringu magnetronowego przy wybranych warunkach procesu

Grudniewski¹,

Lubańska²,

Czernik³

2015

ZNPRzBiS

View full text Add to dashboard Cite

Oprócz precyzyjnego pomiaru topografii powierzchni z rozdzielczością umożliwiają-cą obserwowanie warstw atomowych, współczesne urządzenia tego typu oferują wiele dodatkowych możliwości, obejmujących badanie właściwości elektrycznych, magnetycznych jak i zmian zachodzących przy wahaniach temperatury. Jednym z zastosowań może być charakteryzacja otrzymanych warstw na podstawie obserwowanych obrazów struktur oraz powiązanie obserwowanej struktury z parametrami elektrooptycznymi. Szczególnie interesujące są struktury przewodzące prąd, przeźroczyste oraz takie, które absorbują jak najwięcej energii z padającego promieniowania [3][4][5][6][7]. Autorzy w niniejszej pracy wykonali badania metodą mikroskopii sił atomowych (AFM NT-MDT Ntegra Spectra C -Rys.1.) cienkich warstw SnO 2 otrzymanych w procesie napylania w Line 440 Alliance Concept. Postanowiono zbadać zależności pomiędzy topografią warstw a temperaturą procesu napylania, ilością gazów biorą-cych udział w procesie oraz równolegle własnościami elektrycznymi. Starano się odszukać zależności umożliwiające charakteryzowanie parametrów elektro-optycznych warstw SnO 2 (uzyskiwanych w różnych temperaturach) w oparciu o obrazy pozyskane techniką AFM. Autorzy uważają, że badania struktur z wykorzystaniem AFM usprawnią dobór procesów napylania celem otrzymania oczekiwanych własności elektrycznych i optycznych. Otrzymane podczas prac rezultaty pozwalają na chwilę obecną skorelować własności elektro-optyczne warstw z ich topografią oraz procesami wytwarzania. Przeprowadzone eksperymenty pozwoliły w fazie finalnej na otrzyanie przezroczystych tlenków SnO 2 o zakładanej rezystancji.

show abstract

Characterization of W Films on Si and SiO2/Si Substrates by X-Ray Diffraction, AFM and Blister Test Adhesion Measurements

Cited by 20 publications

References 17 publications

Microvalves for Natural-Gas Analysis With Poly Ether Ether Ketone Membranes

Microvalves for Natural-Gas Analysis With Poly Ether Ether Ketone Membranes

<title>Automated interferometric system for bulge and blister test measurements of micromachined membranes</title>

Charakterystyka AFM cienkich warstw SnO2 uzyskanych podczas sputteringu magnetronowego przy wybranych warunkach procesu

Contact Info

Product

Resources

About