“…At present, the -Ga 2 O 3 films could be prepared by many methods, such as molecular beam epitaxy (MBE) [11], pulsed laser deposition [12], plasma enhanced atomic layer deposition (PEALD) [13], electron beam evaporation [14], radio frequency magnetron sputtering [15], spray pyrolysis technique [16], sol-gel method [17], metal organic chemical vapor deposition (MOCVD) [18] and metal organic vapor phase epitaxy (MOVPE) [1]. In our experiment, the MOCVD method is chosen for its flexibility, controllability, scalability into larger commercial systems, and applicability to current device technology [19,20]. Because high quality -Ga 2 O 3 substrates are hard to obtain, the -Ga 2 O 3 films are usually prepared on other substrates, such as Al 2 O 3 , Si, GaAs, MgO, MgAl 2 O 4 , and GaN [1,18,[21][22][23][24][25].…”