“…The central novel finding of our work is an observation that the Hall effect in polycrystalline OFETs is systematically “underdeveloped”, even though the longitudinal mobility is high. The Hall effect is called underdeveloped, when the Hall mobility, μ Hall , is substantially smaller than the longitudinal field‐effect mobility, μ FET , (μ Hall < μ FET ), and, respectively, the Hall carrier density, n Hall , is systematically greater than the capacitively defined (total) carrier density, n FET , induced in the accumulation channel ( n Hall > n FET ) . To understand the mechanism of this effect, besides blends, we have also investigated high‐quality polycrystalline rubrene thin films with a large grain size previously developed by Fusella et al These films can be viewed as an ideal polycrystalline organic semiconductor due to the very large grain size of up to ≈1 mm and crystallographically well‐defined grain boundaries, with a highly compact film morphology extended over macroscopically large areas (up to 1 cm 2 ).…”