2018
DOI: 10.1016/j.nima.2018.06.062
|View full text |Cite
|
Sign up to set email alerts
|

Charge-collection properties of irradiated depleted CMOS pixel test structures

Abstract: Edge-TCT and charge collection measurements with passive test structures made in LFoundry 150 nm CMOS process on p-type substrate with initial resistivity of over 3 kΩcm are presented. Measurements were made before and after irradiation with reactor neutrons up to 2·10 15 n eq /cm 2 . Two sets of devices were investigated: unthinned (700 µm) with substrate biased through the implant on top and thinned (200 µm) with processed and metallised backplane. Depletion depth was estimated with Edge-TCT and collected ch… Show more

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

4
16
0

Year Published

2018
2018
2022
2022

Publication Types

Select...
5
1
1

Relationship

2
5

Authors

Journals

citations
Cited by 18 publications
(20 citation statements)
references
References 29 publications
4
16
0
Order By: Relevance
“…The measured charge is less than the amount of charge deposited in depletion region estimated with Edge-TCT. A similar observation was made in [21], where the effect was attributed to biasing the detector from the top, causing charge 195 trapping in the low electric field region. This effect is smaller in segmented detectors or in detectors with a processed back plane.…”
Section: Discussionsupporting
confidence: 58%
See 1 more Smart Citation
“…The measured charge is less than the amount of charge deposited in depletion region estimated with Edge-TCT. A similar observation was made in [21], where the effect was attributed to biasing the detector from the top, causing charge 195 trapping in the low electric field region. This effect is smaller in segmented detectors or in detectors with a processed back plane.…”
Section: Discussionsupporting
confidence: 58%
“…For measurements of charge collection the sample was mounted between two collimators with 90 Sr source on one side and a scintillator coupled to a photomultiplier for triggering on the other side. The large pixel array was used achieved by biasing the detector from the back, but this approach requires back plane processing [21].…”
Section: Charge Collection Measurementsmentioning
confidence: 99%
“…High charge collection efficiency after radiation damage can be expected from a large charge collection electrode, together with the possibility of applying back-side reverse bias to achieve more uniform drift field. Measurement of a previous prototype shows that a depletion depth over 100 µm is achievable with such sensor design after particle fluence of 10 15 n eq /cm 2 [12], the expected NIEL radiation fluence for the ITk outer pixel layers. However, it may suffer from large detector capacitance, e.g.…”
Section: Sensor Conceptsmentioning
confidence: 96%
“…The breakdown was measured at -280 V, an improvement over previous chip generation in the same technology [15], thanks to a new guard ring structure [16]. Such high breakdown voltage is likely to ensure a sufficient depletion after irradiation [7,12]. Noise and threshold distribution The noise performance and threshold distribution were studied by scanning an external injection voltage and recording the sensor response.…”
Section: I-v Curvementioning
confidence: 99%
“…Unthinned devices of 700 μm with topside biasing and thinned devices of 200 μm with backside biasing in the 150 nm HR/HV-CMOS node from LFoundry have been irradiated with neutrons for a range of fluences [24]. Measured results show that the depletion depth of unirradiated devices grows with the bias voltage very similarly in both cases, until the thinned devices reach full depletion.…”
Section: Nm Hr/hv-cmos Node From Lfoundrymentioning
confidence: 99%