The novel technology resulting from the merger of a Charge Coupled Device (CCD) capability with a Complementary Metal Oxide Semiconductor (CMOS) process allows a large class of charge-based circuits to be integrated with CMOS circuits. CCD's can perform image-to-charge conversion, spatial shifting, analog storage, and many other linear signal processing functions necessary for vision. This capability, in conjunction with an analog CMOS process, should prove to be a very useful technology in implementing an integrated early vision system. This paper describes the technology development necessary for the integration of a four phase, buried-channel CCD capability in an existing 1.75 micron CMOS process. This enhancement requires an additional implant step, a second gate oxidation, a second level of polysilicon, and an additional etching step, adding two more lithographic levels to the 11 mask CMOS process. In addition, this process allows the fabrication of poly-to-poly capacitors with low voltage and temperature coefficients that are useful in many analog MOS applications. The process utilizes a 23nm gate dielectric for high transconductance and a 42nm poly-to-poly capacitor insulator. The poly-oxide provides excellent electrical isolation, and results in a C0 value which allows for good component matching. Experimental results are presented.