2007
DOI: 10.1063/1.2759987
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Charge injection process in organic field-effect transistors

Abstract: The charge injection process in top-contact organic field-effect transistors was energetically observed with displacement of the Fermi level as a result of scanning the gate voltage. Doping of charge-transfer molecules into the metal/organic interface resulted in low interface resistance, which unveiled the bulk transport of the injected charges from the contact metal into the channel. The authors found that the bulk transport clearly obeys the Meyer-Neldel rule, according to which the exponential density of s… Show more

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Cited by 150 publications
(124 citation statements)
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“…The contact resistance in a transistor includes the resistance at the metal/organic interface (interface resistance, R int ) and the resistance at the access region (access resistance, R acs ), where charge carriers transport from the metal/semiconductor interface to the conducting channel. 20,21 In our work, not only were the electrode materials but also the crystalline and surface properties of the organic semiconductors nearly the same. 16 Meanwhile, the MoO 3 inserting layer between Au and C 8 -BTBT can greatly enhance the charge injection into the organic layer.…”
mentioning
confidence: 88%
“…The contact resistance in a transistor includes the resistance at the metal/organic interface (interface resistance, R int ) and the resistance at the access region (access resistance, R acs ), where charge carriers transport from the metal/semiconductor interface to the conducting channel. 20,21 In our work, not only were the electrode materials but also the crystalline and surface properties of the organic semiconductors nearly the same. 16 Meanwhile, the MoO 3 inserting layer between Au and C 8 -BTBT can greatly enhance the charge injection into the organic layer.…”
mentioning
confidence: 88%
“…These materials are therefore suitable for both electron and hole injection into the CuPc layer which is actually observed as ambipolar transport. The question why F 4 TCNQ/gold exclusively reveals hole injection, although its work function is only slightly higher than that for gold, may be explained by the tendency of F 4 TCNQ to block electron injection [32], while the injection of holes is also improved. This assumption is confirmed by the fact that the contact resistance for holes is smallest with F 4 TCNQ/gold as injecting contact.…”
Section: Electron and Hole Transport In Neat Films Of Cupcmentioning
confidence: 99%
“…Contact resistance is therefore an experimentally accessible measure of charge injection which quantifies the loss of channel voltage in an OTFT. Measurements have shown the contact resistance of OTFTs can be modified by doping [303], interlayers [304] and self-assembled monolayers [305] and more generally is influenced by film thickness [306], injection barrier [307] and electrode shape [308]. Such variations in contact resistance are predicted to have a substantial effect on the performance of OTFTs.…”
Section: Organic Thin-film Transistors (Otfts)mentioning
confidence: 99%