2022
DOI: 10.1021/acsanm.2c03264
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Charge Separation in Monolayer WSe2 by Strain Engineering: Implications for Strain-Induced Diode Action

Abstract: Strain-engineering band structure in transition-metal dichalcogenides (TMDC) is a promising avenue toward capabilities in optoelectronics. For example, controlling the flow of optically generated quasiparticles can be achieved by a localized strain field which reduces the bandgap and generates an energy-band gradient that funnels neutral excitons to the strain apex. It would be even more advantageous to mimic a diode's internal field, where both conduction and valence bands bend in the same direction, to separ… Show more

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Cited by 11 publications
(14 citation statements)
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“…In the case of WSe 2 , biaxial strain bends down both the conduction band minimum and valence band maximum at different rates, leading to an overall bandgap narrowing. 36 In trigonal Te, shear (hydrostatic or uniaxial) strain causes the material to change from a trivial insulator to a strong topological insulator. 37 Ultimately, both the observed defects and strain will influence the behavior of this moireh eterostructure.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…In the case of WSe 2 , biaxial strain bends down both the conduction band minimum and valence band maximum at different rates, leading to an overall bandgap narrowing. 36 In trigonal Te, shear (hydrostatic or uniaxial) strain causes the material to change from a trivial insulator to a strong topological insulator. 37 Ultimately, both the observed defects and strain will influence the behavior of this moireh eterostructure.…”
Section: Resultsmentioning
confidence: 99%
“…In addition, the observed strains in WSe 2 and Te are known to alter the optoelectronic properties. In the case of WSe 2 , biaxial strain bends down both the conduction band minimum and valence band maximum at different rates, leading to an overall bandgap narrowing . In trigonal Te, shear (hydrostatic or uniaxial) strain causes the material to change from a trivial insulator to a strong topological insulator .…”
Section: Resultsmentioning
confidence: 99%
“…Such a design allows both functions of parallel capacitor and field-effect transistor (FET) for 2D materials under strain. 16 To apply biased gate voltages to the GaSe flake, only the electrodes S and G are connected to form a parallel capacitor-like device. A detailed description of the substrate design, patterning, and fabrication is in Figure S1 and the Methods section.…”
mentioning
confidence: 99%
“…The GaSe flake forms a tented structure as reported in our previous work. , Both ends of the GaSe flake are connected with the electrodes S and D, respectively. Such a design allows both functions of parallel capacitor and field-effect transistor (FET) for 2D materials under strain . To apply biased gate voltages to the GaSe flake, only the electrodes S and G are connected to form a parallel capacitor-like device.…”
mentioning
confidence: 99%
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