Chemical bath deposition synthesis and electrochemical properties of MnO2 thin film: Effect of deposition time and bath temperature

Abstract

Manganese dioxide (MnO 2 ) films with different nanostructures were deposited on indium tin oxide (ITO) glasses by using chemical bath deposition (CBD). Deposition temperature and time were varied from 60°C to 90°C and from 2 h to 72 h, respectively. The samples have been characterized using an X-ray diffraction (XRD), field emission scanning electron microscope (SEM) and an electrochemical workstation. The films deposited at 60°C for 8 h showed that obtained nanoflowers had an amorphous nature, while those deposited at higher temperatures of 70, 80 and 90°C showed a well-developed nanowire and nanorod morphology. However, those which were deposited at 60°C, showed the best electrochemical properties, including a higher specific capacitance, good rate of performance and a cycling stability (93 % loss of the initial value after 10,000 cycles).

Rapid synthesis of blue emitting ZnO nanoparticles for fluorescent applications

“…ZnO nanoparticles synthesized have estimated band gap values of 3.28 eV, 3.29 eV, 3.33 eV and 3.39 eV for samples prepared at a temperature of 500, 400, 300 and°200 C respectively. Thus, the estimated band gap energy of the ZnO nanoparticles was found to decrease with the increase in the decomposition temperature and similar results were obtained by Kathalingam et al [21]. It is clear that when the particle size increases, the electronic states are not discrete as a result the band gap energy reduces and the oscillator strength decreases [5,22].…”

MnO2 Nanoflower Integrated Optoelectronic Biointerfaces for Photostimulation of Neurons

“…Then, to form nanoflowers on the seed layer, a MnO 2 nanoflower layer is formed on top of the seed layer by chemical bath deposition via immersing the return electrode into the highly concentrated Na 2 SO 4 : MnSO 4 :K 2 S 2 O 8 aqueous solution. [ 14 ] Once this step is completed, MnO 2 nanoflowers (with a mean size distribution of 279 ± 169 nm) (Figure S3 , Supporting Information) are formed onto the MnO 2 seed layer. The MnO 2 seed layer facilitates enhanced nanoflower density during chemical bath deposition while the chemical bath deposition parameters, as in the case of nanoflower growth on ITO, were kept constant (Figure 1d ).…”

“…Then, to form a high‐surface‐area porous oxide layer for obtaining a large return electrode capacitance, the MnO 2 NFs layer was formed on top of the MnO 2 seed layer by chemical bath deposition. In this technique, the MnO 2 seed layer was immersed into the highly concentrated Na 2 SO 4 :MnSO 4 :K 2 S 2 O 8 (0.33 m :0.33 m :0.33 m ) aqueous solution [ 14 ] for 2 h at 60 °C to form nanoflowers on the return electrode region, then they are annealed at 70 °C for ITO substrates. Chemical bath deposition duration remained the same for all substrates with a slight alteration in bath temperature and annealing temperature to have similar morphologies and ensure attachment of nanoflowers (Table S2 , Supporting Information).…”

The Electrochemical Performance of Deposited Manganese Oxide-Based Film as Electrode Material for Electrochemical Capacitor Application

“…In addition to this, the change in experimental parameters also produces materials with different electrochemical properties. The common preparation methods are the hydrothermal, chemical bath deposition, polyol synthesis, sol-gel, electrodeposition, solvothermal, and co-precipitation [20,36,39,[41][42][43][44][45]. The specific capacitances obtained ranges from 121.5 to 698 F g À1 , which is still lower than the theoretical specific capacitance of manganese oxide (1380 F g À1 ).…”