2018
DOI: 10.1016/j.rinp.2018.11.029
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Chemical bonds in nitrogen-doped amorphous InGaZnO thin film transistors

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Cited by 16 publications
(6 citation statements)
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“…After irradiation, the peak for Zn 2p shifts to higher binding energies (1021.79 and 1044.58 eV for ZIF‐8 (MO), 1021.87 and 1044.59 eV for ZIF‐8 (MB)), implying an interaction with MO and MB. Zn 2p 3/2 of ZIF‐8 is deconvoluted into two peaks, attributed to the ZnN bond at 1020.94 eV and the ZnO bond at 1021.48 eV 55,56 . In the presence of ZIF‐8 (MO) and ZIF‐8 (MB), the ZnN bond seems to be replaced by the ZnO bond.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…After irradiation, the peak for Zn 2p shifts to higher binding energies (1021.79 and 1044.58 eV for ZIF‐8 (MO), 1021.87 and 1044.59 eV for ZIF‐8 (MB)), implying an interaction with MO and MB. Zn 2p 3/2 of ZIF‐8 is deconvoluted into two peaks, attributed to the ZnN bond at 1020.94 eV and the ZnO bond at 1021.48 eV 55,56 . In the presence of ZIF‐8 (MO) and ZIF‐8 (MB), the ZnN bond seems to be replaced by the ZnO bond.…”
Section: Resultsmentioning
confidence: 99%
“…Zn 2p 3/2 of ZIF-8 is deconvoluted into two peaks, attributed to the Zn N bond at 1020.94 eV and the Zn O bond at 1021.48 eV. 55,56 In the presence of ZIF-8 (MO) and ZIF-8 (MB), the Zn N bond seems to be replaced by the Zn O bond. Thus, ZIF-8 undergoes partial hydrolysis in the reaction media, following the detection of Zn O peaks at 1021.43 eV for ZIF-8 (MO) and at 1021.48 eV for ZIF-8 (MB).…”
Section: Nitrogen Adsorption Isothermsmentioning
confidence: 99%
“…An increase in the temperature induces an increase in trapping holes at the interface, which reduces the channel carriers, resulting in a left shift of V th . For the a-IGZO TFT, oxygen vacancies as free electrons could be thermally excited with increasing temperature, hence the increase in I on . Consequently, when writing “1” to VL, VR needs to be discharged to a lower voltage at a higher temperature to switch on P2, and P2 also needs to overcome the higher current of N2, leading to a larger transition time.…”
Section: Results and Disccusionmentioning
confidence: 99%
“…For the a-IGZO TFT, oxygen vacancies as free electrons could be thermally excited with increasing temperature, hence the increase in I on . 27 Consequently, when writing "1" to VL, VR needs to be discharged to a lower voltage at a higher temperature to switch on P2, and P2 also needs to overcome the higher current of N2, leading to a larger transition time. Besides, the transition time of writing "0" is mainly affected by the right shift of V th of a-IGZO TFT.…”
Section: Thermal Stability Of the Srammentioning
confidence: 99%
“…However, the electrical performance and stability properties of a-IGZO TFTs still need further improvements for their applications in FPDs and other fields [4,5]. Recently, some researchers—including our group—reported that nitrogen-doping (N-doping) effectively improved the electrical properties (e.g., subthreshold swing (SS) and bias-stress stability) of a-IGZO TFTs by decreasing the number of deep states and oxygen vacancies (Vo) in the device channel layers and reducing the channel/dielectric interface trap density with N atoms incorporated into the a-IGZO film [6,7,8]. However, the field-effect mobility (μ FE ) of the nitrogen-doped a-IGZO (a-IGZO:N) TFT devices also decreases due to the suppression of the oxygen vacancy (Vo) level in their channel layers, the main source of free electrons in oxide semiconductors [9,10].…”
Section: Introductionmentioning
confidence: 99%