1981
DOI: 10.1116/1.570934
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Chemical information from XPS—applications to the analysis of electrode surfaces

Abstract: Application of target factor analysis and linear least squares fitting to extracting chemical information from Auger depth profiles of a Mo/Si thin multilayer system Shape information from a critical point analysis of calculated electron density maps: application to DNAdrug systems AIP Conf.

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Cited by 355 publications
(220 citation statements)
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“…The literature reports metallic Cu with a characteristic peak in the range of 918.2 to 918.6 eV; Cu 2 O has a reported peak between 916.0 and 916.4 eV, and the peak for the CuO standard increases from 917.6 to 917.8 eV. [49][50][51][52][53][54][55] The acid-treated Cu sheet resulted in spectra similar to those previously reported in the literature for air-oxidized metallic Cu. 54,55 This oxidized layer was reported to be in the size range of 1.6 to 2.7 nm.…”
Section: Structural Characterizationsupporting
confidence: 69%
See 1 more Smart Citation
“…The literature reports metallic Cu with a characteristic peak in the range of 918.2 to 918.6 eV; Cu 2 O has a reported peak between 916.0 and 916.4 eV, and the peak for the CuO standard increases from 917.6 to 917.8 eV. [49][50][51][52][53][54][55] The acid-treated Cu sheet resulted in spectra similar to those previously reported in the literature for air-oxidized metallic Cu. 54,55 This oxidized layer was reported to be in the size range of 1.6 to 2.7 nm.…”
Section: Structural Characterizationsupporting
confidence: 69%
“…The XPS spectra of the Cu 2p region are very challenging to interpret because the metallic state of Cu and Cu(I) have statistically similar binding energy values ( Figure S7a). [49][50][51][52][53][54][55] Hence, the X-ray generated Auger spectra were recorded in the Cu L 3 M 45 M 45 region, and the results are presented in Figure 7a. The literature reports metallic Cu with a characteristic peak in the range of 918.2 to 918.6 eV; Cu 2 O has a reported peak between 916.0 and 916.4 eV, and the peak for the CuO standard increases from 917.6 to 917.8 eV.…”
Section: Structural Characterizationmentioning
confidence: 99%
“…+ complex ions (+0.38 V) are also formed during the preparation of the Ag precursor solution. 11,24,25) This decrease can improve the stability of the complex and reduces the likelihood of free Ag particles forming in the solution. 5,11) The SEM images and XRD results in Figs.…”
Section: Resultsmentioning
confidence: 99%
“…To remove larger nanoparticles, a filtration of CMP slurries is usually conducted. Nevertheless, even after filtering of the slurries, defects are often observed on the polished surfaces and may be higher than expected [44]. As a result, there is a suspicion that some of the defects may be created by the agglomeration of nanoparticles formed during the CMP process.…”
Section: Stabilization Of Cmp Slurriesmentioning
confidence: 94%
“…The selective layer copper in CuO and Cu 2 O have BE values of about 933.4 eV and 934.5 eV, respectively [35,44]. CuO signals can be identified clearly for the sample of pH 8.…”
Section: Effect Of the Slurry Nanoparticle Size And Concentrationmentioning
confidence: 99%