2009
DOI: 10.4012/dmj.28.68
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Chemical mechanical polishing of titanium with colloidal silica containing hydrogen peroxide-mirror polishing and surface properties

Abstract: Chemical mechanical polishing (CMP) of cpTi (Ti) was carried out using two types of slurries, acidic and basic colloidal silica containing H2O2 up to 3 wt%, to obtain flat and mirror-polished surfaces without any contaminated and reacted layers. Polishing behavior and surface properties were investigated using AFM, EPMA, and XPS. Weight loss of Ti polished by CMP using the basic slurry was larger than that using the acidic one, and surface roughness was less than 2 nm RMS when basic slurry containing 3 wt% H2O… Show more

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Cited by 32 publications
(12 citation statements)
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“…Its excellent polishing ability [1] is used for shaping and smoothing high-precision in semiconductor production and optical lenses preparation. SiO 2 also improves the hardness of decorative coatings, provides them with anti-soiling properties and delivers high pigment dispersion [2,3].…”
Section: Introductionmentioning
confidence: 99%
“…Its excellent polishing ability [1] is used for shaping and smoothing high-precision in semiconductor production and optical lenses preparation. SiO 2 also improves the hardness of decorative coatings, provides them with anti-soiling properties and delivers high pigment dispersion [2,3].…”
Section: Introductionmentioning
confidence: 99%
“…However, since interfacial regions intrinsically contain small amounts of material, conventional chirally sensitive spectroscopic tools, routinely applied to characterize biomaterials, cannot be used due to lack of sensitivity. Consequently, routine laboratory based characterization of biointerfaces is generally provided by atomic force microscopy (AFM), which uses topographical and mechanical properties to establish the macromolecular shape of the molecules based on correlation averaged image reconstruction. , However, rapid detection of subtle structural and orientation differences between similar molecules with AFM can be challenging. Here, we report a plasmonic phenomenon which is based on the sensitivity of phase retardation effects in plasmonic transparency on the spatial arrangement of protein molecules within the near-field.…”
mentioning
confidence: 99%
“…Ground surfaces were created using SiC papers ranging from 600 to 1200 mesh, reaching an average roughness (R a ) of about 0.4 lm. For polished surfaces, SiC papers were used down to 2400 mesh, and samples were additionally polished with an OP-Chem polishing cloth, wetted with an OP-S colloidal silica (SiO 2 ) suspension with a mean grain size of 0.25 lm with the addition of 15 % hydrogen peroxide (H 2 O 2 ) as reported in [33]. Mirror-like surfaces were obtained with R a & 0.04 lm.…”
Section: Methodsmentioning
confidence: 99%