2007
DOI: 10.1143/jjap.46.6971
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Chemical Processing and Characterization of Ferroelectric (K,Na)NbO3 Thin Films

Abstract: Lead-free ferroelectric K 0:5 Na 0:5 NbO 3 (KNN) thin films have been synthesized by the chemical solution deposition. The optimization of excess amounts of K and Na in KNN precursor solutions was found to be effective for achieving perovskite KNN single-phase thin films with improved leakage current properties. It was revealed from Raman spectroscopic analysis data that a change in scattering mode was observed for the KNN thin films fabricated under various processing conditions. This change was due to the ch… Show more

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Cited by 97 publications
(107 citation statements)
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“…In addition to studies of bulk piezoelectric and ferroelectric ceramics, the research on thin films has been promoted by miniaturization trends in electronics and micro-electro-mechanical systems [2]. In both the vapour-and solution-based deposition routes for KNN films, volatilization of the alkali compounds has been identified as the major processing problem [3][4][5][6]. The loss of alkalis may hinder the control over the composition and promote the formation of undesirable, alkalideficient, secondary phases [4,5], as well as the formation of alkali and oxygen vacancies, which are thought to be the main reason for the large leakage currents observed in KNN films [5][6][7].…”
Section: Introductionmentioning
confidence: 99%
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“…In addition to studies of bulk piezoelectric and ferroelectric ceramics, the research on thin films has been promoted by miniaturization trends in electronics and micro-electro-mechanical systems [2]. In both the vapour-and solution-based deposition routes for KNN films, volatilization of the alkali compounds has been identified as the major processing problem [3][4][5][6]. The loss of alkalis may hinder the control over the composition and promote the formation of undesirable, alkalideficient, secondary phases [4,5], as well as the formation of alkali and oxygen vacancies, which are thought to be the main reason for the large leakage currents observed in KNN films [5][6][7].…”
Section: Introductionmentioning
confidence: 99%
“…In both the vapour-and solution-based deposition routes for KNN films, volatilization of the alkali compounds has been identified as the major processing problem [3][4][5][6]. The loss of alkalis may hinder the control over the composition and promote the formation of undesirable, alkalideficient, secondary phases [4,5], as well as the formation of alkali and oxygen vacancies, which are thought to be the main reason for the large leakage currents observed in KNN films [5][6][7]. The non-ferroelectric response in KNN thin films was also related to chemical heterogeneities in the films evidenced by the presence of secondary phases [8].…”
Section: Introductionmentioning
confidence: 99%
“…Due to the volatility of sodium and potassium, adding an excess amount of these elements in precursors can compensate for the loss of A-site elements and result in films with improved properties [77][78][79][80][81][82]86]. Excess sources of Na and K largely suppress the formation of cation and anion vacancies in the films, eliminate the formation of secondary phases such as K 4 Nb 6 O 17 , and improve the surface roughness.…”
Section: Knn Films Prepared By Chemical Deposition Techniquesmentioning
confidence: 99%
“…The optimization of CSD-derived KNN films by the addition of proper amounts of K and Na sources to the precursor solutions improves the ferroelectric and leakage current behavior of the films by eliminating secondary phases (K 4 NbO 17 ) and decreasing the concentration of charge carriers [82]. The volatilization of A-site elements triggers the formation of oxygen vacancies to maintain charge neutrality in the film.…”
Section: Knn Films Prepared By Chemical Deposition Techniquesmentioning
confidence: 99%
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