1990
DOI: 10.1016/0022-3093(90)90191-n
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Chemical reactions at silica surfaces

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Cited by 151 publications
(132 citation statements)
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“…It is now agreed that the relative contribution of the geminals on the silica's surface is relatively small to the total number of silanol groups. Morrow [43] observed that a small quantity of silicon atoms on the silica's surface (less than 5% of the total concentration of silanols) treated at 700 ∘ C carried out geminal silanols; while most of the silicon atoms Figure 11: Representation of different silanol groups (isolated, silanediol and Silanetriol silanols), H-bonded silanols (single and silanediol) alongside siloxanes bridges on the surface of colloidal silica [42] carried single hydroxyl groups being either free or vicinal silanols.…”
Section: Silica Surface Structure (Physisorbed Water Silanol Groups mentioning
confidence: 99%
“…It is now agreed that the relative contribution of the geminals on the silica's surface is relatively small to the total number of silanol groups. Morrow [43] observed that a small quantity of silicon atoms on the silica's surface (less than 5% of the total concentration of silanols) treated at 700 ∘ C carried out geminal silanols; while most of the silicon atoms Figure 11: Representation of different silanol groups (isolated, silanediol and Silanetriol silanols), H-bonded silanols (single and silanediol) alongside siloxanes bridges on the surface of colloidal silica [42] carried single hydroxyl groups being either free or vicinal silanols.…”
Section: Silica Surface Structure (Physisorbed Water Silanol Groups mentioning
confidence: 99%
“…Thus, the preparation of highly dispersed metal oxides on silica by either impregnation or chemical vapor deposition often involves a highly reactive H-sequestering precursor, such as V-alkoxides, which will readily react with the surface hydroxyls of the silica support. 12,19,20 The aqueous impregnation method with NH 4 VO 3 as the precursor usually results in a low dispersion (<5 wt % V 2 O 5 ). 10,13,14,16,18 On the other hand, the CVD method with V-ethoxide as the precursor may result in thin overlayers of V 2 O 5 on SiO 2 with polymerized V-O-V bonds.…”
Section: Introductionmentioning
confidence: 99%
“…Extensive characterization experiments under dehydrated conditions have also been conducted by means of in situ IR, UV-Vis DRS, XPS, XANES, and 27 Al NMR, 4j 1 Use of Oxide Ligands in Designing Catalytic Active Sites which provide additional molecular information about the supported MO x phases on SiO 2 [77][78][79][80]. The supported 5% TiO 2 /SiO 2 and 5% ZrO 2 /SiO 2 samples consist of 100% dispersed surface TiO x and ZrO x species on the SiO 2 support.…”
Section: Molecular Structural Determination Of Supported Metal Oxide mentioning
confidence: 99%
“…These supported metal oxide catalysts consist of highly dispersed surface metal oxide species -the catalytic active sites -anchored to the underlying oxide support. Over the decades, there have been many successful methods of controlling and anchoring the molecularly dispersed metal oxide phase by chemical vapor deposition (CVD) [26][27][28], incipient wetness impregnation [29][30][31][32][33][34], and precipitation [35][36][37]. The surface coverage of the metal oxide overlayer can vary from below to above monolayer coverage or the maximum dispersion limit, that is, maximum metal oxide dispersion before formation of crystalline metal oxide nanoparticles (NPs).…”
Section: Introductionmentioning
confidence: 99%