Chemical sputtering of carbon films by low energy N2+ ion bombardment

Hammer, Peter; Gissler, W.

doi:10.1016/0925-9635(96)00527-4

Cited by 89 publications

(42 citation statements)

References 23 publications

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“…The data shown in Figure 1 are not yet adequate for investigation of the ion energy dependence of Y(C/N), and hence a mean critical value of R(I/A) at which the film formation begins to cease can be estimated to be equal to 0.21 in our case. The value estimated in this study for the Y(C/N) is in line with that obtained by Hammer and Gissler, 8 implying that the contribution of physical sputtering is small.…”

Section: Resultssupporting

confidence: 80%

“…6 Assuming that physical sputter is negligible owing to low ion energies, they estimated that the chemical sputtering yield Y(C/N), defined by the ratio of the number of sputtered carbon atoms to that of incident atomic nitrogen in the ion beam, is equal to 0.25 ± 0.05. 6,8 The higher the R(I/A), the stronger the formation rate of volatile CN compounds and, consequently, the film formation ceases. The data shown in Figure 1 are not yet adequate for investigation of the ion energy dependence of Y(C/N), and hence a mean critical value of R(I/A) at which the film formation begins to cease can be estimated to be equal to 0.21 in our case.…”

Section: Resultsmentioning

confidence: 99%

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Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition

Sucasaire¹,

Matsuoka²,

Lopes³

et al. 2006

J. Braz. Chem. Soc.

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Filmes de nitreto de carbono, preparados por deposição assistida por feixe de íons, foram estudados pela espectroscopia de Raman e infravermelho, em função de energia de íons (200, 400, e 600 eV) e razão de chegada de íon a átomo R(I/A) de 0,9 a 2,5. A razão de composição N/C no filme, determinada por análise de detecção de recuo elástico, foi encontrada proporcional a R(I/A); porém, a formação de filme é possível somente se R(I/A) for menor do que um valor crítico da eficiência de "sputtering" químico. Esse valor encontrado foi de 0,21. O valor máximo de N/C obtido foi de 0,9 (47% atômica de nitrogênio) para o filme depositado com 400 eV. Para entender o efeito de incorporação de nitrogênio na estrutura dos filmes, os parâmetros foram determinados pela análise dos espectros Raman e encontrados fortes dependências da quantidade de nitrogênio nos filmes; os comportamentos da posição e da largura do pico G, e da razão I D /I G são correlacionados com as mudanças estruturais nos filmes.Carbon nitride films prepared by ion beam assisted deposition were studied by Raman and infrared spectroscopy, as a function of nitrogen ion energy (200, 400, and 600 eV) and the ion to atom arrival rate ratio R(I/A) ranging from 0.9 to 2.5. The composition ratio N/C in the film determined by elastic recoil detection analysis was found to be proportional to R(I/A); however, the film growth is possible only if R(I/A) is smaller than a critical value of chemical sputtering yield. This value was found to be 0.21. The maximum value of N/C obtained was 0.9 (47 at.% of nitrogen) for the film deposited with ion energy of 400 eV. In order to understand the effect of nitrogen incorporation on the structure of the films, the parameters were determined from the Raman spectra analysis of the films and found to show strong dependences of the nitrogen content in the films; the behaviors of the G peak position and width, and I D /I G ratio are correlated with the structure changes in the films.

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Section: Resultssupporting

confidence: 80%

Section: Resultsmentioning

confidence: 99%

Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition

Sucasaire¹,

Matsuoka²,

Lopes³

et al. 2006

J. Braz. Chem. Soc.

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“…chemical sputtering could account for the observed reduction of the net deposition rates. There are many hints in the literature that chemical sputtering plays an important role in the interaction of nitrogen containing hydrocarbon plasmas with a-C:H surfaces [12][13][14][15][16][17].…”

Section: Introductionmentioning

confidence: 99%

Growth and erosion of amorphous carbon (a-C:H) films by low-temperature laboratory plasmas containing H and N mixtures

Schwarz-Selinger

Hopf

Sun

et al. 2007

Journal of Nuclear Materials

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Growth and erosion of amorphous hydrogenated carbon (a-C:H) films from nitrogen-containing gas mixtures was studied in an electron-cyclotron-resonance low-temperature plasma. Deposition and erosion rates were measured as a function of nitrogen admixture and ion energy. At low energy, N 2 addition to methane plasmas causes a reduction of the deposition rates that does not exceed significantly the expected reduction due to dilution. At higher ion energies the deposition rate reduces further and finally switches to net erosion. Erosion of a-C:H films in N 2 /H 2 mixtures is much more efficient than in pure H 2 and N 2 . The erosion rate drops with increasing N 2 admixture almost proportional to the total ion flux if the substrate is at floating potential. For higher ion energies the erosion rate dramatically increases and shows a clear maximum at around 25 % N 2 flow ratio.

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“…If the radical is formed in sublayers, C 2 N 2 molecule is created [60]. In the case of nitrogen plasma of hydrocarbon film, we can also observe erosion of the surface and formation CN radicals.…”

Section: Reactive Etching/plasma Treatment By Gases Containing Nitrogenmentioning

confidence: 86%

Microplasma Drug Delivery

Shimizu¹,

Krištof²

2018

Plasma Medicine - Concepts and Clinical Applications

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There are several techniques to perform drug delivery. One of the newest methods of drug delivery through the skin is the application of plasma. Reactive species generated by plasma can change the chemical composition of the skin, change the structure and extract lipids of the lipid barrier, create pores in or etch the surface of the skin. These changes have an influence on the barrier function of the skin which can be decreased. The main barrier of the skin is called stratum corneum. The structure and composition of the stratum corneum and function of the components is described. Possible interaction of plasma particles with skin is presented and compared with interaction of plasma species with carbon or hydrocarbon surfaces. Active species which can effectively interact with lipid molecules is introduced. Hydrophilic drugs and drugs with high molecular weight can penetrate very difficult through the skin or cannot penetrate the skin at all. As a model, a drug, Cyclosporine A, was studied. Cyclosporine A is a lipophilic drug with a molecular weight of 1203 Da which is used during and after organ transplantation to prevent rejection. The Hairless Yucatan micropig was used to simulate human skin. A film electrode was used to generate plasma that was used for skin treatment. An AC voltage (V 0-p = 0.6-1.5 kV, 25 kHz) was applied with flowing gas (5 L/min). The barrier function of the skin was evaluated by a Franz cell experiment and high performance liquid chromatography (HPLC) for a particular drug. An effective amount of drug in human body was determined by pharmacokinetic model.

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Chemical sputtering of carbon films by low energy N2+ ion bombardment

Cited by 89 publications

References 23 publications

Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition

Raman and infrared spectroscopy studies of carbon nitride films prepared on Si (100) substrates by ion beam assisted deposition

Growth and erosion of amorphous carbon (a-C:H) films by low-temperature laboratory plasmas containing H and N mixtures

Microplasma Drug Delivery

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