2020
DOI: 10.1021/accountsmr.0c00063
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Chemical Vapor Deposition Growth of Two-Dimensional Compound Materials: Controllability, Material Quality, and Growth Mechanism

Abstract: HMC)CONSPECTUS: Two-dimensional (2D) compound materials are promising materials for use in electronics, optoelectronics, flexible devices, etc. because they are ultrathin and cover a wide range of properties. Among all methods to prepare 2D materials, chemical vapor deposition (CVD) is promising because it produces materials with a high quality and reasonable cost. So far, much efforts have been made to produce 2D compound materials with large domain size, controllable number of layers, fast-growth

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Cited by 158 publications
(116 citation statements)
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“…In particular, CVD using vapours from S and MoO 3 powders has been widely explored by several research groups, since it is a cost-effective method to produce MoS 2 domains with good crystalline quality on different substrates [31][32][33]. Although monolayer flakes with a triangular or hexagonal shape and lateral extension from tens to hundreds of micrometres have been obtained under optimized CVD conditions [34], achieving coverage and thickness uniformity on the wafer scale still represents a huge challenge, due to the difficulty of controlling all the parameters involved in the process (including the substrate temperature, the evaporation rates of the S and Mo precursors, the pressure in the chamber, and the carrier gas flow rate) [35][36][37][38][39].…”
Section: Introductionmentioning
confidence: 99%
“…In particular, CVD using vapours from S and MoO 3 powders has been widely explored by several research groups, since it is a cost-effective method to produce MoS 2 domains with good crystalline quality on different substrates [31][32][33]. Although monolayer flakes with a triangular or hexagonal shape and lateral extension from tens to hundreds of micrometres have been obtained under optimized CVD conditions [34], achieving coverage and thickness uniformity on the wafer scale still represents a huge challenge, due to the difficulty of controlling all the parameters involved in the process (including the substrate temperature, the evaporation rates of the S and Mo precursors, the pressure in the chamber, and the carrier gas flow rate) [35][36][37][38][39].…”
Section: Introductionmentioning
confidence: 99%
“…CVD method, as one of the most promising approaches to synthesize large-scale and high-quality 2D materials, [48][49][50] has been widely applied in preparing different types of vdW heterostructures. Compared to mechanical stacking method, CVD could generate large-area heterostructures with fewer interlayer contaminations and stronger interlayer coupling.…”
Section: The Synthesis Methods Of Vdw Heterostructuresmentioning
confidence: 99%
“…One factor that influences the uniformity of the layer number largely is the uniformity of the precursor feeding. [206][207][208] In the conventional powder CVD, it is a "point-to face" metal-source supply with the metal oxides precursors placed in the upstream, or below the substrate. [209] It is extremely hard to control the uniformity because the inhomogeneous release rates of the metal precursor in different direction and low repeatability due to the time-to-time difference.…”
Section: Layer Numbermentioning
confidence: 99%