Chemical Vapor Infiltration of Boron Nitride Interphase in Ceramic Fiber Preforms: Discussion of Some Aspects of the Fundamentals of the Isothermal Chemical Vapor Infiltration Process

Cholet, V.; Vandenbulcke, L.

doi:10.1111/j.1151-2916.1993.tb04026.x

Cited by 29 publications

(13 citation statements)

References 29 publications

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“…Recent developments of BN deposition from the gas phase aim at the preparation of two-phase B4C-BN composite coatings, which should be an attractive way of the improvement of fracture toughness [1]. Also, it was postulated that properties of ceramic-matrix composites can be enhanced if BN can be deposited on fibers due to matrix infiltration by the gas phase [2]. Moreover, being itself a III-V compound, BN may find an application as superior insulator film on III-V compound semiconductors [3,4].…”

Section: Ciencymentioning

confidence: 99%

Deposition of boron nitride on graphite at 1300 K

Pawlas-Foryst

Fitzner

1997

Mikrochim Acta

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Abstract.A method for the deposition of BN onto graphite and other substrates is described. Boron tricbloride (BC13) and ammonia (NH3) diluted with Ar were used as reacting gases. The deposition process was carried out at 1300 K as well as lower temperatures in an open system at pressures of 1 arm. The consequences of the introduction of hydrogen to the system were considered. It was demonstrated that the replacement of argon with hydrogen increases the efficiency of the process as well as the theoretical rate of BN deposition. However, the acceleration of the deposition seems to be unprofitable, because the resulting supersaturation leads to the formation of an amorphous phase. The modification of the experimental conditions were proposed. In the previous paper [5-1 we discussed conditions for BN deposition by thermal decomposition of a gas mixture from boron trichloride (BC13) and ammonia (NH3) diluted in argon without hydrogen. Theoretical analysis of the CVD process depicted the optimal conditions under which this process could be carried out. In this part of our study we report the preparation of BN deposit by chemical vapour deposition onto * Dedicated to Professor Dr. rer. nat. Dr. h.c. Hubertus Nickel on the occasion of his 65th birthday ** To whom correspondence should be addressed graphite from a BC13 + NH 3 + Ar gas mixture in an open system at 1 atm total pressure and at a substrate temperature of 1300 K. ExperimentalProcedure Figure 1 illustrates the apparatus and gas delivery system used for CVD growth of the BN deposit. The BC13 (99.9%) obtained from Merck (Germany) was admitted into the evaporation vessel (8) and then diluted in the mixing chamber (7) with argon (14). Both of these gases as well as NH 3 (99.9%) obtained from Fertilisers Factory, Pulawy (Poland), were introduced into the system through electronic flowmeters (9, 10, 11) delivered by Brooks Instrument (The Netherlands). The NH 3 gas was introduced directly into the silica reaction tube, while the BC13 + Ar gas mixture was introduced there through another tube placed in the center of the reactor in order to avoid the premature reaction of BC13 with ammonia. The ends of these tubes were narrowed to form nozzles. The reaction chamber enclosed the graphite substrate (4) on which the deposition process takes place. The substrate was placed on the supporting silica tube just underneath the gas distributing nozzles. The temperature of the substrate is measured by Pt-PtRhl0 thermocouple which is kept inside the silica tube supporting the substrate (5). Outlet gases were absorbed in the indicator solution and in water. The quartz reactor was kept inside the movable resistance furnace (2) where temperature was controlled by Eurotherm 815 temperature controller (6).After the substrate was placed inside the reactor tube the whole system was flushed with argon dried in silica gel and MgC104 columns. Then the temperature was raised and when it reached a constant value ammonia gas was passed through the system. NH 3 gas was cleaned by passing it th...

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Section: Ciencymentioning

confidence: 99%

Deposition of boron nitride on graphite at 1300 K

Pawlas-Foryst

Fitzner

1997

Mikrochim Acta

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“…The experimental devices for depositing thin films by CVD and ICVI have been described in details elsewhere [5,9]. Both are hot wall reactors with a graphite susceptor heated by a high frequency generator.…”

Section: Methodsmentioning

confidence: 99%

“…[6] CVD and ICVI of BN and Si-B-N ternary system, microstructure: The procedures for depositing BN from BCl 3 -NH 3 -H 2 mixture and Si-B-N layers by adding MTS to these reactants have been described in detail previously. [9] One characteristic of this study on BN deposition was the simultaneous processing on bulk substrates (CVD) and fibrous preforms (ICVI) that allowed to gain more insight into the deposition mechanism that influences the growth conditions and the deposit structure. [10,11] The influence on the size of the coherent domains, on their orientation relatively to the direction of growth and the interlayer distance in BN were evidenced.…”

mentioning

confidence: 99%

Outstanding Ceramic Matrix Composites for High Temperature Applications

Vandenbulcke¹,

Fantozzi

Goujard³

et al. 2005

Adv Eng Mater

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Accurate deposition of boron and silicon carbides and nitrides permits to improve the oxidation resistance of self‐healing matrices of multilayered composites. The uniformity and the microstructure of each layer and of their interfaces induce the final properties of these composites. Their mechanical behaviour in conditions very close to the applications in the energy, space and aeronautic domains, allows to demonstrate the breakthrough enabled by this new composite generation.

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“…However, its higher kinetics requires to use a lower temperature, in the 500-700°C range, to obtain a good infiltration [83,85]. The variation of the nanostructure of BN coatings deposited by different chemical vapor processes was reported as a fbnction of various parameters including the process type (CVD or ICVI), the fiber nature and the processing parameters 1861.…”

Section: Boron Nitride Interphasesmentioning

confidence: 99%

“…The deposition apparatus and procedure have been described in detail previously [83]. BN deposition was carried out simultaneously on a fibrous preform and on a bulk substrate to investigate both ICVI and CVD.…”

Section: Cvd and Icvi Of Boron Nitride From Bclrnh-h2 Mixtrnresmentioning

confidence: 99%