Chemically amplified resists and acid amplifiers

Thackeray, James W.

doi:10.1016/b978-0-08-100354-1.00007-7

Cited by 3 publications

(1 citation statement)

References 47 publications

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“…Patterning materials such as chemically amplified photoresists are conventionally comprised of organic polymers. − Their patterning mechanisms are well understood, and they have supported deep ultraviolet photolithography at 193 nm in semiconductor manufacturing for nearly 2 decades. ,,− …”

Section: Introductionmentioning

confidence: 99%

High-Resolution Lithographic Patterning with Organotin Films: Role of CO₂ in Differential Dissolution Rates

Kenane

Keszler

2021

ACS Appl. Mater. Interfaces

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Details of the chemistry enabling the patterning of organotin photoresists to single-digit-nm resolution continue to engage study. In this report, we examine the contributions of atmospheric gases to the differential dissolution rates of an n-butyltin oxide hydroxide photoresist. Cryo scanning tunneling electron microscopy (cryo-STEM) produces a micrograph of the latent image of an irradiated resist film, readily distinguishing exposed and unexposed regions. Temperature-programmed desorption mass spectrometry (TPD-MS) and cryo electron energy loss spectroscopy (cryo-EELS) show that irradiated films are depleted in carbon through desorption of butane and butene. Upon aging in air, irradiated films absorb H2O, as previously established. TPD-MS also reveals a previously unrecognized absorption of CO2, which correlates to a heightened dissolution contrast. This absorption may play an active role in determining intrinsic patterning performance and its variability based on changes in atmospheric-gas composition.

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Section: Introductionmentioning

confidence: 99%

High-Resolution Lithographic Patterning with Organotin Films: Role of CO₂ in Differential Dissolution Rates

Kenane

Keszler

2021

ACS Appl. Mater. Interfaces

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Principles of Laser Heat-Mode Lithography

Wei

2019

Laser Heat-Mode Lithography

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Photoacid generators. Application and current state of development

Kuznetsova¹,

Малков²,

Gribov³

2020

Russ. Chem. Rev.

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Photoacid generators are used as components of photocurable polymer formulations and chemically amplified photoresists in microelectronics industry. In recent years, these compounds gained importance as components of various engineering materials. The review presents the classification of photoacid generators and summarizes data on photochemical processes giving photoacids. A special section is devoted to practical applications of photoacid generators and the current state of their development. The bibliography includes 118 references.

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Chemically amplified resists and acid amplifiers

Cited by 3 publications

References 47 publications

High-Resolution Lithographic Patterning with Organotin Films: Role of CO₂ in Differential Dissolution Rates

High-Resolution Lithographic Patterning with Organotin Films: Role of CO₂ in Differential Dissolution Rates

Principles of Laser Heat-Mode Lithography

Photoacid generators. Application and current state of development

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Chemically amplified resists and acid amplifiers

Cited by 3 publications

References 47 publications

High-Resolution Lithographic Patterning with Organotin Films: Role of CO2 in Differential Dissolution Rates

High-Resolution Lithographic Patterning with Organotin Films: Role of CO2 in Differential Dissolution Rates

Principles of Laser Heat-Mode Lithography

Photoacid generators. Application and current state of development

Contact Info

Product

Resources

About

High-Resolution Lithographic Patterning with Organotin Films: Role of CO₂ in Differential Dissolution Rates

High-Resolution Lithographic Patterning with Organotin Films: Role of CO₂ in Differential Dissolution Rates