ChemInform Abstract: Chemistry of Organosilicon Compounds. Part 356. Molecular Structure and Photochemical Reactions of Trimethylsilylmethyl‐Substituted Masked Disilene.

Abstract

1998 organo-silicon compounds, nonmetal heterocycles organo-silicon compounds, nonmetal heterocycles S 0067 -184Chemistry of Organosilicon Compounds.Part 356. Molecular Structure and Photochemical Reactions of Trimethylsilylmethyl-Substituted Masked Disilene.-The new masked disilene (III) is prepared and the regioselectivity of its addition reactions with phenols via disilene (V) is discussed. The molecular structure of (III) is determined by single crystal X-ray diffraction. -(HOSHI, T.; SHIMADA, R.; KAB-UTO, C.; SANJI, T.; SAKURAI, H.; Chem. Lett. (1998) 5, 427-428; Dep.