Described herein is that a novel InBr 3 /PhSiH 3 reducing system in a 1,4-dioxane solution smoothly and effectively undertook deoxygenation of a variety of sulfoxides leading to the facile preparation of sulfide derivatives. Also, it was demonstrated that the reducing system shows a higher reactivity towards sulfoxides than that towards commonly reducible functional groups, such as carboxylic acids, esters, amides, and sulfones.

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(Trimethylsilylmethyl)trimethyldisilene was generated photochemically from 1-phenyl-7-trimethylsilylmethyl-7,8,8-trimethyl-7,8-disilabicyclo[2.2.2]octa-2,5-diene (masked disilene). UV spectrum and regioselectivity of the addition reaction of phenols to the disilene were discussed. The molecular structure of the masked disilene was also determined by single-crystal X-ray diffraction.

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1998 organo-silicon compounds, nonmetal heterocycles organo-silicon compounds, nonmetal heterocycles S 0067 -184Chemistry of Organosilicon Compounds.Part 356. Molecular Structure and Photochemical Reactions of Trimethylsilylmethyl-Substituted Masked Disilene.-The new masked disilene (III) is prepared and the regioselectivity of its addition reactions with phenols via disilene (V) is discussed. The molecular structure of (III) is determined by single crystal X-ray diffraction. -(HOSHI, T.; SHIMADA, R.; KAB-UTO, C.; SANJI, T.; SAKURAI, H.; Chem. Lett. (1998) 5, 427-428; Dep.