2012
DOI: 10.1103/physrevb.85.195453
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Chemomechanics control of tearing paths in graphene

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Cited by 39 publications
(44 citation statements)
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“…4(e)). In amorphous GeTe, E F is already pinned at the mid-gap by many mechanisms, as reported in previous works [22,28]. Thus, the small number of N-doping-induced gap states does not alter the E F behavior at the mid-gap in the amorphous phases.…”
supporting
confidence: 77%
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“…4(e)). In amorphous GeTe, E F is already pinned at the mid-gap by many mechanisms, as reported in previous works [22,28]. Thus, the small number of N-doping-induced gap states does not alter the E F behavior at the mid-gap in the amorphous phases.…”
supporting
confidence: 77%
“…The 2N-doping preserves the valence and reduces the calculation costs for the spin-polarization effect. The presence of germanium vacancies (V Ge ) in combination with N-doping is also examined because V Ge is the most stable native defect in crystalline GeTe [21,22].…”
mentioning
confidence: 99%
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“…The main advantage of this approach in modeling reacting systems is that it often reduces the magnitude of high velocity atoms, which, in turn, provides more stability as changes in bonding occur throughout a simulation. While a majority of ReaxFF studies have used the Berendsen thermostat, others have used the Nose–Hoover thermostat . The Nose–Hoover thermostat scales velocities such that the canonical distribution of velocities is produced for equilibrium systems with moderate thermostat coupling.…”
Section: Resultsmentioning
confidence: 99%
“…Reciprocally, local chemical environment and the associated kinetics may also mediate stress generation and mechanical failure of the materials, as exemplified by the hydrogen and lithium (Li) embrittlement [5,6], oxygen-regulated fracture paths in graphene [7], and stress fiber formation in living cells [8]. Such kinetics-stress coupling is universal, but particularly predominant in the electrochemical lithiation of the high-capacity electrode materials, including silicon (Si) and germanium (Ge).…”
mentioning
confidence: 99%