Chlorine migration under electron bombardment observed by aes

Bouquet, Stéphane; Bergner, J.; Hericy, J. Le; Langeron, J.P.

doi:10.1016/0368-2048(82)85032-9

Cited by 7 publications

(11 citation statements)

References 14 publications

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“…Secondary electron emission as a function of oxygen partial pressure was recorded for Mg and A1 using AES (680). The temperature-dependent low-energy electron diffraction intensity profiles from aluminum (100), (110), and (111) were measured (954). The oxidation of (111) aluminum single crystals has been investigated by using EELS (653), XPS (740), and XPS with surface EXAFS (44,670).…”

Section: Metalsmentioning

confidence: 99%

“…The temperature-dependent low-energy electron diffraction intensity profiles from aluminum (100), (110), and (111) were measured (954). The oxidation of (111) aluminum single crystals has been investigated by using EELS (653), XPS (740), and XPS with surface EXAFS (44,670). SIMS has been used to study oxygen adsorption on single crystal aluminum and some of its alloys (586).…”

Section: Metalsmentioning

confidence: 99%

“…Clean samples became embrittled and desorbed hydrogen, while oxygen-contaminated samples showed limited hydrogen absorption. The migration of chlorine on a Ti-Al alloy surface during electron bombardment was observed with AES (111).…”

Section: Metalsmentioning

confidence: 99%

“…Angle-resolved UPS was employed during the study of the molecular adsorption of carbon monoxide on clean and sodium-covered Cu(lll) (558). An EELS study of nitric oxide adsorption on Cu(100) and - (111) was performed and distinct differences were observed for the two surfaces (981). Chemisorption of HC1 and H2S by Cu(lll)-0 surfaces was shown by XPS (640) to involve hydrogen abstraction with the formation of surface hydroxyl groups.…”

Section: Metalsmentioning

confidence: 99%

“…The dissociative chemisorption of carbon monoxide on Cr (110) was investigated, using EELS (460). Oxide formation on (001), (Oil), (111), and (113) surfaces of Cr thin films was examined with scanning TEM and a mechanism for the formation of the oxides was deduced (971,972). prepared and studied by using AES and LEED.…”

Section: Metalsmentioning

confidence: 99%

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Forensic science

Brettell¹,

Saferstein²

1983

Anal. Chem.

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He Joined the company in 1959 as a radiochemist. His current work is directed toward developing advanced techniques for semiconductor materials characterization using electron beam (scanning Auger) and in microprobe techniques for chemical imperfections. X-ray topography, and scanning transmission electron microscopy techniques for physical imperfections. Larrabee earned a B.Sc. from the University ol Bishop's College In Quebec and an M.Sc. in chemistry from McMaster University in Ontario, Canada. He has published in analytical, electrochemical, and instrumentation journals and contributed chaplers In books. He has coauthored a book on the characterization of semiconductor materials and coedited a book on the characterization of solid surfaces. Larrabee is a member of the ACS, Electrochemical Society, SAS, and the Dallas Society of Analytical Chemists. R. Allen Bowling received his B.S. In Chemistry from the University ol Alabama and a Ph.D. In Chemistry from ihe University of Tennessee.He held an Alexander von Humboldt postdoctoral research position at the Institute ol Inorganic Chemistry, University of Frankfurt, West Germany, from March 1979 to July 1980. He joined Texas Instruments Incorporated in September 1980 as a process control engineer in a semiconductor processing area. In January 1982, he became a member of the technical staff in the Materials Characterization Branch of the Materials Science Laboratory of Texas Instruments, where he is presently responsible for Auger and XPS instrumentation. Bowling is a member of the Electrochemical Society and the American Vacuum Society.

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