CIDNP-Nachweis von radikalen während der photolyse von η3 allyl-übergangsmetallverbindungen

Benn, Reinhard; Wilke, Günther

doi:10.1016/s0022-328x(00)91512-2

Cited by 12 publications

(2 citation statements)

References 10 publications

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“…The compound is expected to have reasonable volatility and thermal stability as it can be purified by sublimation in a high vacuum at 60 -70 ®C [95]. It has also been shown to be photolytically active, undergoing loss of ligands on exposure to UV radiation [96].…”

Section: Structures and Propertiesmentioning

confidence: 99%

Laser photodeposition of molybdenum oxide thin films from organometallic precursors

Olson¹

1990

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Section: Structures and Propertiesmentioning

confidence: 99%

Laser photodeposition of molybdenum oxide thin films from organometallic precursors

Olson¹

1990

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“…The use of UV spectroscopy for detecting allyl radicals and following the kinetics of their reactions has been referred to above [21,22]. There are scattered references to the use of CIDNP for the study of radical pairs involving allyl; mainly from the decomposition of organometallic compounds [60][61][62]. The IR spectrum of allyl radicals has not yet been identified, but approaches to this problem are being made [63].…”

Section: Spectroscopic Detection and Spin Trappingmentioning

confidence: 99%

ESR studies of acyclic delocalised radicals

Walton

1984

Res Chem Intermed

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Organometallic chemical vapor deposition using allyl precursors

Kirss

1992

Applied Organom Chemis

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Homoleptic allyl derivatives of many Main-Group and transition metals, M(C,H,),, are readily available through one-pot syntheses using metal halides and allyl Grignard reagents or by alkylation of alkali-metal salts. The relatively low molecular weight of a C3H, ligand contributes to high vapor pressures whilst the stability of the allyl radical is predicted to reduce decomposition temperatures. These compounds represent a class of volatile precursors for organometallic chemical vapor deposition (OMCVD) of thin films. Film growth studies using iridium, molybdenum, palladium, platinum, rhodium, selenium, tellurium and tungsten compounds are reviewed and the relationships between pyrolysis pathways and film purity are discussed.

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CIDNP-Nachweis von radikalen während der photolyse von η3 allyl-übergangsmetallverbindungen

Cited by 12 publications

References 10 publications

Laser photodeposition of molybdenum oxide thin films from organometallic precursors

Laser photodeposition of molybdenum oxide thin films from organometallic precursors

ESR studies of acyclic delocalised radicals

Organometallic chemical vapor deposition using allyl precursors

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