Circular polarized electron cyclotron resonance source

et al. 2007

Plasma Process. Polym.

Stochastic subwavelength structures on polymethylmetacrylate (PMMA) surfaces were produced by low‐pressure argon/oxygen plasma treatment. The modified surfaces show antireflective properties exhibiting low scattering losses depending on the size and the density of the structure. It is demonstrated that the antireflection performance is a function of the mean ion energy and working pressure that are controllable by process parameters, namely plasma power and gas flow. A model is suggested that assumes a self‐assembling etch mask as reason for the growth of the pins with about 70–90 nm in lateral dimension and up to 600 nm in height.

Section: Experimental Partmentioning

confidence: 95%

Broadband Antireflective Structures on PMMA by Plasma Treatment

Leitel

Kaless

et al. 2007

Plasma Process. Polym.

“…For the etching step, the plasma ion source (APS) of the coating plant was used, so the etching could follow immediately after pre‐coating in the same vacuum cycle. The operating mode of this plasma source is described elsewhere 12. The plasma gases were argon and oxygen in a 1:2 ratio, resulting in a total pressure of 5 × 10 −4 mbar.…”

Section: Experimental Partmentioning

confidence: 99%

Creating Anti‐Reflective Nanostructures on Polymers by Initial Layer Deposition before Plasma Etching

Wendling

Munzert

Plasma Processes & Polymers

et al. 2009

The generation of nanostructures by initial layer deposition and plasma etching offers a simple and cost‐effective method for imparting broadband anti‐reflection properties to polymer optics. In this study, we have investigated the possibility of controlling the structure growth on the cycloolefin polymer Zeonex®. It has been found that the geometry of the emerging nanostructures can be adjusted from “island‐like,” through “sponge‐like,” to “pinholes” merely by changing the thickness of the initial layer before the etching step. However, not all structure types provided a satisfactory transmittance enhancement. Only when the initial layer thickness and the etching time were matched in such a way that a certain material/air filling factor range and a sufficient structure depth were obtained could an outstanding anti‐reflection effect be realized.

“…The reduction in surface reflection, in particular, requires the deposition of well‐adhering optical interference coatings. A common low‐temperature deposition technique suitable for the coating of polymers is plasma‐ion‐assisted evaporation (plasma‐IAD) 2. Coatings that are deposited by this procedure on PMMA generally show very little adhesion to the substrate 3–5.…”

Section: Introductionmentioning

confidence: 99%

Method for the Vacuum Deposition of Optical Coatings on Polymethyl Methacrylate

Munzert

Kaiser

2007

Plasma Process. Polym.

Physical vapor deposition (PVD) of optical coatings on polymethyl methacrylate (PMMA) is known to be problematic because of poor coating adhesion. In this study, we were able to show that short‐wavelength radiation emitted by the coating procedure causes degradation of the PMMA interface and consequently inhibits the adhesion of deposited layers. Allowing for this fact, we developed an anti‐reflection coating that provides good adhesion on PMMA solely by the absorption of this damaging radiation in the first protective layer.