2014
DOI: 10.1039/c4nr04296d
|View full text |Cite
|
Sign up to set email alerts
|

Classic, liquid, and matrix-assisted dip-pen nanolithography for materials research

Abstract: As a powerful atomic force microscopy-based nanotechnological tool, dip-pen nanolithography (DPN) has provided an ideal direct-write "constructive" lithographic tool that allows materials to be patterned from DPN tips onto a surface with high registration and sub-15 nm resolution. In the past few decades, DPN has been enormously developed for studying the patterning of inorganic, organic, and biological materials onto a variety of substrates. The focus of this review is on the development of three types of DPN… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
26
0

Year Published

2016
2016
2023
2023

Publication Types

Select...
5
2

Relationship

0
7

Authors

Journals

citations
Cited by 26 publications
(26 citation statements)
references
References 115 publications
(123 reference statements)
0
26
0
Order By: Relevance
“…Furthermore, agarose can be made ionically conductive hydrogel which will allow metallic deposition or erasing using PLE by modulating the directional molecular transport through electrophoresis ( 64 ). Moreover, more opportunities are also possible wherein PLE can be customized to deposit organic and inorganic materials ( 65 ) and to erase metal oxides and semiconductors ( 13 ). …”
Section: Resultsmentioning
confidence: 99%
“…Furthermore, agarose can be made ionically conductive hydrogel which will allow metallic deposition or erasing using PLE by modulating the directional molecular transport through electrophoresis ( 64 ). Moreover, more opportunities are also possible wherein PLE can be customized to deposit organic and inorganic materials ( 65 ) and to erase metal oxides and semiconductors ( 13 ). …”
Section: Resultsmentioning
confidence: 99%
“…[32,33] Instead of direct control over electrospinning, the second one realizes the microstructures through postmodification of electrospun nanofibers using typical microelectromechanical system or inject-printing. [34][35][36][37][38][39] Despite the remarkable flexibility in microstructures induced by lithography, the state-of-the-art technology is limited both by the possible contamination from residual photoresists and by the applicable materials (photocurable materials). Thus, there is still a need for a green, straightforward, and universal strategy to micropattern electrospun nanofibers.In this paper, we propose a facile and robust method for direct patterning of electrospun nanofibers via solvent-loaded agarose hydrogel stamps.…”
mentioning
confidence: 99%
“…Another important technique in the arsenal of the nanolithographer is dip pen nanolithography . This method is based on an atomic force microscopy (AFM) tip that is coated with “dry” or liquid ink solutions by a dipping action . Numerous patterning tasks of this technique have been reported .…”
Section: Introductionmentioning
confidence: 99%
“…[28] This method is based on an atomic force microscopy (AFM) tip that is coated with "dry" or liquid ink solutions by a dipping action. [29] Numerous patterning tasks of this technique have been reported. [30] However, this technique has certainly not been applied to industry.…”
Section: Introductionmentioning
confidence: 99%