Cleaning technology for EUV multilayer mirror using atomic hydrogen generated with hot wire

Kinetics of reduction of a RuO2(110) film on Ru(0001) by atomic hydrogen

“…A thin carbon or oxide film on the optics significantly reduces the reflectivity [1,8] and therefore should be removed for the optimal operation of the instrument. Exposure of the mirror to molecular hydrogen [9][10][11][12] or atomic hydrogen [13][14][15][16][17] is a prospective method to mitigate these contaminants.…”

Mechanism and model of atomic hydrogen cleaning for different types of carbon contamination on extreme ultraviolet multilayers

“…There are several ways to clean the carbon contamination, such as Radio Frequency (RF)-O 2 /H 2 , UV/O 2 , EUV/O 2 and atomic hydrogen [5][6][7][8]. Atomic hydrogen is considered to have the most potential for removing carbon contaminants on EUV multilayers because it causes little oxidation or other damage to the surface of the multilayer.…”

Comparison of metal oxide removal using hydrogen radicals generated by hot-wire and plasma-enhanced methods

“…Moreover, the substrate is damaged by the plasma. The HW method, which overcomes the abovementioned disadvantages, can be used for removing various metal oxides [7], for removing contaminants from extreme ultraviolet mirrors [8], and in inkjet printing technology [9]. Hydrogen radical generation by plasma enhanced and HW methods are both useful technologies; however, a direct comparison of their cleaning capabilities is yet to be reported.…”