2023
DOI: 10.1007/s00170-023-11960-7
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Cluster magnetorheological global dynamic pressure planarization processing of single crystal sapphire

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Cited by 2 publications
(1 citation statement)
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“…The primary purpose of these grooves is to vary the distance between the workpiece and the polishing pad regularly, enhancing the effectiveness of magnetorheological polishing. In a comparative study of grooves, wedges, circular microporous arrays, and smooth surface polishing discs, B. Luo et al found that the microporous array polishing disc, with a systematically designed structure, achieved a rough surface of 0.104 nm for sapphire ultra-smooth machining under optimal process conditions [131][132][133].…”
Section: Application Of Flexible Contact Wear Processing Technologymentioning
confidence: 99%
“…The primary purpose of these grooves is to vary the distance between the workpiece and the polishing pad regularly, enhancing the effectiveness of magnetorheological polishing. In a comparative study of grooves, wedges, circular microporous arrays, and smooth surface polishing discs, B. Luo et al found that the microporous array polishing disc, with a systematically designed structure, achieved a rough surface of 0.104 nm for sapphire ultra-smooth machining under optimal process conditions [131][132][133].…”
Section: Application Of Flexible Contact Wear Processing Technologymentioning
confidence: 99%