2020
DOI: 10.1515/nanoph-2019-0470
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CMOS-compatible a-Si metalenses on a 12-inch glass wafer for fingerprint imaging

Abstract: Metalenses made of artificial sub-wavelength nanostructures have shown the capability of light focusing and imaging with a miniaturized size. Here, we report the demonstration of mass-producible amorphous silicon metalenses on a 12-inch glass wafer via the complementary metal-oxide-semiconductor compatible process. The measured numerical aperture of the fabricated metalens is 0.496 with a focusing spot size of 1.26 μm at the wavelength of 940 nm. The metalens is applied in an imaging system to test the imaging… Show more

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Cited by 59 publications
(46 citation statements)
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“…At no sidewall inclination, the metalens designed here has comparable performance with a similar design that is experimentally demonstrated in Ref. [52]. As shown by the results of Fig.…”
Section: A-si Metalenssupporting
confidence: 74%
“…At no sidewall inclination, the metalens designed here has comparable performance with a similar design that is experimentally demonstrated in Ref. [52]. As shown by the results of Fig.…”
Section: A-si Metalenssupporting
confidence: 74%
“…The monolithic fabrication process can be developed based on the mature CMOS fabrication technology. More functional optical components using the materials on the existing CMOS-compatible fabrication line, including Si [51,176], SiO 2 [177], SiN [178] and AlN [179,180], are expected to be demonstrated. More large-area metasurface-based optical components are expected to be realized by deep UV photolithography for mass manufacturing [113].…”
Section: Discussionmentioning
confidence: 99%
“…Besides facial recognition, the fingerprint sensor is also one of the most widely deployed sensors for biometric identification. Different physical mechanisms have been implemented to capture the fingerprint information including optical imaging, capacitive imaging and ultrasonic sensing [51][52][53][54]. However, most systems have issues in detection under various circumstances, such as wet/dry finger, poor contact and susceptibility to spoofing.…”
Section: Biometric Sensor Systemsmentioning
confidence: 99%
“…For example, in a study by Zhang et al [9,80,81], metasurface devices in the mid-infrared wavelength range were fabricated using photolithography, and in a study by Chen et al [32] and Hu et al [82], metasurface devices were designed in the terahertz and microwave frequencies. Recently, there has been a trend in using deep-UV photolithography with an excimer laser source to fabricate metasurfaces at the visible [14] and the near-infrared wavelength [10,83] in an attempt for scalability and mass production.…”
Section: Step 4: Modeling Of Full Lensmentioning
confidence: 99%
“…In fact, this is a hot research topic in the entire metasurface community. Recently, demonstrations of largearea metalenses with single wavelength operation in the visible and near-infrared wavelength ranges [10,14,83,189] and achromatic focusing of small area metalenses [190,191] have been reported. Hence, it is promising that this challenge can be solved soon with the advancement in both metasurface design methodologies and fabrication techniques [44].…”
Section: Future Directionsmentioning
confidence: 99%