2016 28th International Symposium on Power Semiconductor Devices and ICs (ISPSD) 2016
DOI: 10.1109/ispsd.2016.7520869
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CMOS SOI gate driver with integrated optical supply and optical driving for fast power transistors

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Cited by 8 publications
(5 citation statements)
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“…7. presents the characterization of one 5V submodule, which was designed and previously validated [14]. The output 5V…”
Section: B Preliminary Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…7. presents the characterization of one 5V submodule, which was designed and previously validated [14]. The output 5V…”
Section: B Preliminary Resultsmentioning
confidence: 99%
“…PMOS and NMOS of one submodule have a RDSon of 0.26Ω (25°C), +/-5A source/sink capability and a maximum slew rate of 5V/ns. Other specifications can be found in [14].…”
Section: B Preliminary Resultsmentioning
confidence: 99%
“…The isolated DC/DC converters used in gate drivers are generally realized by a Push-Pull converter or sometimes by a Flyback topology [7,10,24,25]. Gate drivers using an optical power transfer have also been studied [26,27]. Although these methods provide an optimal commonmode rejection, the low efficiency of the photoelectric transducers makes them inadequate for power modules command (power consumption >1W).…”
Section: Conventional Power Supply Topologies Used In Gate Drivermentioning
confidence: 99%
“…The integration of photonic functionality in CMOS is promising for high-speed data communication, and opto-electronic system-on-chip applications. For most contemporary photonic and/or opto-electronic integrated circuits [1]- [5], CMOS technology is commonly extended with a dedicated waveguide (WG) layer having a low material absorption coefficient (α) and a high refractive index (n) for photonic functionalities [1]. Some industrial CMOS technologies, however, offer built-in thin films suitable as WGs, the most common being the silicon (Si) layer in silicon-on-insulator (SOI) technology [1], [5]- [7].…”
mentioning
confidence: 99%
“…For most contemporary photonic and/or opto-electronic integrated circuits [1]- [5], CMOS technology is commonly extended with a dedicated waveguide (WG) layer having a low material absorption coefficient (α) and a high refractive index (n) for photonic functionalities [1]. Some industrial CMOS technologies, however, offer built-in thin films suitable as WGs, the most common being the silicon (Si) layer in silicon-on-insulator (SOI) technology [1], [5]- [7]. Recently, a monolithic optocoupler was realized in standard high-voltage SOI CMOS [6], which not only includes an SOI layer as a WG for infrared (IR) light, but also a thin silicon nitride (Si 3 N 4 ) film laid atop the active Si surface, which is a potential WG for visible and IR light [7]- [12].…”
mentioning
confidence: 99%