2014
DOI: 10.1002/adma.201401168
|View full text |Cite
|
Sign up to set email alerts
|

Color‐Selective and CMOS‐Compatible Photodetection Based on Aluminum Plasmonics

Abstract: A color-selective, band-engineered photodetector is demonstrated. The device uses two Schottky junctions to accumulate charge in an energy well, which results in photocurrent gain and a plasmonic aluminum grating for photocurrent enhancement and red-green-blue color selectivity. This work provides a more intelligent way to design imaging sensors by integrating amplifiers and color filters directly into pixels.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3

Citation Types

1
150
0

Year Published

2015
2015
2021
2021

Publication Types

Select...
7

Relationship

1
6

Authors

Journals

citations
Cited by 183 publications
(151 citation statements)
references
References 50 publications
1
150
0
Order By: Relevance
“…[1][2][3][4][5][6][7][8][9][10][11][12] Among these examples are color filters based on plasmonics; filters which rely on the resonant interaction between incident photo ns and the free-electrons of nanoscale metal structures. Thus far, filters based on positive nanostructures, [4,7,9,[11][12][13][14][15] filters based on cavity apertures, [2,[16][17][18] and filters which combine both strategies [8] have been shown, each with distinct fabrication and geometrical solutions to achieving color "nanopixels" for selective white-light separation. Plasmonic pixels, in their various forms, hold several advantages reactive ion etching, and inductively coupled plasma deposition).…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…[1][2][3][4][5][6][7][8][9][10][11][12] Among these examples are color filters based on plasmonics; filters which rely on the resonant interaction between incident photo ns and the free-electrons of nanoscale metal structures. Thus far, filters based on positive nanostructures, [4,7,9,[11][12][13][14][15] filters based on cavity apertures, [2,[16][17][18] and filters which combine both strategies [8] have been shown, each with distinct fabrication and geometrical solutions to achieving color "nanopixels" for selective white-light separation. Plasmonic pixels, in their various forms, hold several advantages reactive ion etching, and inductively coupled plasma deposition).…”
Section: Introductionmentioning
confidence: 99%
“…Chief among these are their subwavelength dimensions (leading to ultradense, ultrathin pixel arrays), and their long-term environmental stability (they do not degrade or fade over time due to radiation exposure). As a result, plasmonic filters have been positioned as new technological solutions for subwavelength color printing, [1,4,[7][8][9]12] anticounterfeiting measures, [19,20] and RGB splitting for image sensors; [2,17,21,22] thus representing one of the most promising, technologically relevant areas of current plasmonic research activity. Here, we explore a new application of polarizationcontrolled plasmonic filters: dual output, full-color optical image encoding.…”
mentioning
confidence: 99%
“…In particular, aluminum in nanostructured form has received much recent attention for several reasons: its plasmon resonance is tunable across the entire visible wavelength range, it is an inherently low-cost, sustainable material, and it is compatible with complementary metal-oxide semiconductor (CMOS) manufacturing techniques. 15,17 These factors make aluminum particularly attractive for large-area technological applications, including solar cells, 18,19 filters for color imaging, [20][21][22][23][24] photodetectors, 25 solid-state lighting components, 26 and flat-panel displays. 27,28 To construct plasmonic color devices, nanostructures are typically grouped into micron-scale arrays known as pixels.…”
mentioning
confidence: 99%
“…Plasmonic structures have been demonstrated as a color filter platform well-suited for CMOS integration due to the small mode volumes of plasmons and the CMOS compatibility of many of the materials that support them. Plasmonic hole and slit array color filters have been demonstrated as a viable alternative to dye-based filters for RGB and CMYK color-filtering [3][4][5][6][7][8]. In addition to hole and slit array filters, many other geometries have been explored as potential platforms for commercially viable plasmonic color filters [9][10][11][12].…”
Section: Introductionmentioning
confidence: 99%
“…Previous work has demonstrated plasmonic hole and slit array color filters capable of filtering the visible spectrum into three or four broad spectral bands (>100 nm) [3][4][5][6][7][8]. By reducing the transmission bandwidth of the filters to less than 30 nm, CMOS image sensors would gain the ability to perform multi-and hyper-spectral imaging without needing to rely on algorithmic post-processing [9,14].…”
Section: Introductionmentioning
confidence: 99%