Combined In Situ XPS and UHV-Chemical Force Microscopy (CFM) Studies of the Plasma Induced Surface Oxidation of Polypropylene

Özkaya, Berkem; Grosse-Kreul, Simon; Corbella, Carles; Keudell, Achim von; Grundmeier, Guido

doi:10.1002/ppap.201300105

Cited by 12 publications

(15 citation statements)

References 23 publications

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“…Rather than rely on physically trapped residual inorganic precursors, in these studies, reactive surface sites were introduced to the polymer via oxidative damage by submerging in nitric acid or exposing to oxygen plasma . Oxygen plasma has been shown by X‐ray photoelectron spectroscopy (XPS) to incorporate oxygen‐containing functional groups along poly(propylene)'s hydrocarbon backbone . These pretreatments increase the nucleation rate of Al 2 O 3 ALD by creating reactive sites where TMA chemisorbs on the polymer surface …”

Section: Resultsmentioning

confidence: 99%

Janus Membranes via Diffusion‐Controlled Atomic Layer Deposition

Waldman

Yang

Mandia

et al. 2018

Adv Materials Inter

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The first use of atomic layer deposition (ALD) to produce Janus membranes is reported, with an example system consisting of a compositional gradient ranging from hydrophilic Al2O3 on one face to hydrophobic poly(propylene) on the opposite face. Alternating pulses of trimethyl aluminum and water vapor lead to the growth of covalently bonded Al2O3 conforming to the membrane pore surfaces. Precise control of ALD parameters significantly affects the surface wetting of the modified membrane face and the depth of Al2O3 infiltration into the porosity. This depth control derives from slow precursor diffusion through the 200 nm membrane pores compared to much faster ALD surface reactions. For a given precursor exposure and purge time, increasing the number of ALD cycles decreases the water contact angle at the modified surface from hydrophobic to hydrophilic, until the water droplet is completely imbibed by the membrane. To demonstrate the utility of these Janus membranes, a hydrophilic/superaerophobic Janus treatment is shown to greatly reduce the size of air bubbles generated through the membrane, enabling faster mixing. This technique represents the first application of vapor‐deposited covalently bonded metal oxides to form Janus membranes. Further opportunities are afforded by the ability to laterally pattern Al2O3 across the membrane surface via physical masking.

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Section: Resultsmentioning

confidence: 99%

Janus Membranes via Diffusion‐Controlled Atomic Layer Deposition

Waldman

Yang

Mandia

et al. 2018

Adv Materials Inter

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“…However, for aliphatic polymers, such as polypropylene, poor adhesion of plasma barrier films is a critical point. As reported in the literature, during a typical deposition procedure on a polymer surface, over‐exposure to reactive oxygen species can create a so‐called weak‐boundary layer, with fragmented polymer chains, which potentially leads to adhesion problems and even eventual delamination …”

Section: Introductionmentioning

confidence: 99%

Inhibition of Interfacial Oxidative Degradation During SiO_xPlasma Polymer Barrier Film Deposition on Model Organic Substrates

Özkaya

Mitschker

Özcan

et al. 2015

Plasma Process. Polym.

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Interfacial processes during the initial stages of SiO x -like plasma-polymer barrier coating deposition were investigated by means of polarization modulation infrared reflectionabsorption spectroscopy, and the resulting effect on defect densities were studied by cyclic voltammetry. Octadecanethiol self-assembled monolayers on Au-film coated wafers served as sensor layers to investigate interface chemistry during the plasma deposition. Both the spectroscopic and electrochemical data revealed that a thin SiOCH interlayer could reduce oxidative degradation of the SAM during subsequent deposition of the SiO x barrier film from an oxygen-rich plasma phase. The present electrochemical investigation confirmed effective inhibition of interfacial oxidative degradation processes of an aliphatic polymer in the presence of a SiOCH interfacial layer.

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“…More details on the scPP properties have been reported elsewhere. 41 For all experiments employing scPP/quartz crystals, a new sample was used and all crystals were checked for electrical conductivity and a steady base line at 33 °C. For all three precursors, the same set of experiments were performed: first, one scPP/QCM crystal was used to monitor the growth of two successive runs of 50 cycles (Figure 4a,b for TMA and DMAD, respectively), interrupted by a 60 s break to allow the crystal to equilibrate.…”

Section: ■ Experimental Detailsmentioning

confidence: 99%

PEALD of SiO₂ and Al₂O₃ Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads

Gebhard¹,

Mai²,

Banko³

et al. 2018

ACS Appl. Mater. Interfaces

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A study on the plasma-enhanced atomic layer deposition of amorphous inorganic oxides SiO and AlO on polypropylene (PP) was carried out with respect to growth taking place at the interface of the polymer substrate and the thin film employing in situ quartz-crystal microbalance (QCM) experiments. A model layer of spin-coated PP (scPP) was deposited on QCM crystals prior to depositions to allow a transfer of findings from QCM studies to industrially applied PP foil. The influence of precursor choice (trimethylaluminum (TMA) vs [3-(dimethylamino)propyl]-dimethyl aluminum (DMAD)) and of plasma pretreatment on the monitored QCM response was investigated. Furthermore, dyads of SiO/AlO, using different Al precursors for the AlO thin-film deposition, were investigated regarding their barrier performance. Although the growth of SiO and AlO from TMA on scPP is significantly hindered if no oxygen plasma pretreatment is applied to the scPP prior to depositions, the DMAD process was found to yield comparable AlO growth directly on scPP similar to that found on a bare QCM crystal. From this, the interface formed between the AlO and the PP substrate is suggested to be different for the two precursors TMA and DMAD due to different growth modes. Furthermore, the residual stress of the thin films influences the barrier properties of SiO/AlO dyads. Dyads composed of 5 nm AlO (DMAD) + 5 nm SiO exhibit an oxygen transmission rate (OTR) of 57.4 cm m day, which correlates with a barrier improvement factor of 24 against 5 when AlO from TMA is applied.

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Combined In Situ XPS and UHV-Chemical Force Microscopy (CFM) Studies of the Plasma Induced Surface Oxidation of Polypropylene

Cited by 12 publications

References 23 publications

Janus Membranes via Diffusion‐Controlled Atomic Layer Deposition

Janus Membranes via Diffusion‐Controlled Atomic Layer Deposition

Inhibition of Interfacial Oxidative Degradation During SiO_xPlasma Polymer Barrier Film Deposition on Model Organic Substrates

PEALD of SiO₂ and Al₂O₃ Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads

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Combined In Situ XPS and UHV-Chemical Force Microscopy (CFM) Studies of the Plasma Induced Surface Oxidation of Polypropylene

Cited by 12 publications

References 23 publications

Janus Membranes via Diffusion‐Controlled Atomic Layer Deposition

Janus Membranes via Diffusion‐Controlled Atomic Layer Deposition

Inhibition of Interfacial Oxidative Degradation During SiOxPlasma Polymer Barrier Film Deposition on Model Organic Substrates

PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads

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Product

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About

Inhibition of Interfacial Oxidative Degradation During SiO_xPlasma Polymer Barrier Film Deposition on Model Organic Substrates

PEALD of SiO₂ and Al₂O₃ Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads