2017
DOI: 10.1038/srep39916
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Combining in-situ lithography with 3D printed solid immersion lenses for single quantum dot spectroscopy

Abstract: In the current study, we report on the deterministic fabrication of solid immersion lenses (SILs) on lithographically pre-selected semiconductor quantum dots (QDs). We demonstrate the combination of state-of-the-art low-temperature in-situ photolithography and femtosecond 3D direct laser writing. Several QDs are pre-selected with a localization accuracy of less than 2 nm with low-temperature lithography and three-dimensional laser writing is then used to deterministically fabricate hemispherical lenses on top … Show more

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Cited by 67 publications
(71 citation statements)
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“…A modified excitation spot can excite differently the various QD charged states, resulting in different intensities for different emission lines, as already reported and discussed for instance in Ref. 13,18 . A better understanding of this effect would be provided by the implementation of charge-tunable devices that allow to address specific charged states in the quantum dots 19,20 .…”
mentioning
confidence: 52%
“…A modified excitation spot can excite differently the various QD charged states, resulting in different intensities for different emission lines, as already reported and discussed for instance in Ref. 13,18 . A better understanding of this effect would be provided by the implementation of charge-tunable devices that allow to address specific charged states in the quantum dots 19,20 .…”
mentioning
confidence: 52%
“…1b). In a standard realisation of DLW-printed µ-lenses, the observed increase in the light extraction efficiency is due to a reduction of the Fresnel reflections and an increase in the critical angle of total internal reflection 16,17 . Here, in Superior efficiency of light collection with an elliptical µ-lens compared to the situation with a hemispherical lens for lownumerical-aperture collection optics.…”
Section: Introductionmentioning
confidence: 99%
“…These maps contain a very precise coordinate of the observed quantum dots, and furthermore, their spectral information can be recorded. Once the ideal candidate has been selected, a second exposure laser, collinear with the first one, is used for the direct patterning of the mask . In situ electron beam lithography relies on a similar approach while using cathodoluminescence spectroscopy for the QD localization followed by electron‐beam lithography .…”
Section: Quantum Dots As Nonclassical Light Sourcesmentioning
confidence: 99%
“…µ‐PL map recorded after the fabrication of deterministically positioned markers with the pre‐selected QD centered in between. Reproduced with permission . Copyright 2017, Springer Nature Ltd: Scientific Reports.…”
Section: Quantum Dots As Nonclassical Light Sourcesmentioning
confidence: 99%